- 专利标题: Side inject designs for improved radical concentrations
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申请号: US17102051申请日: 2020-11-23
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公开(公告)号: US11501945B2公开(公告)日: 2022-11-15
- 发明人: Eric Kihara Shono , Vishwas Kumar Pandey , Christopher S. Olsen , Hansel Lo , Agus Sofian Tjandra , Taewan Kim , Tobin Kaufman-Osborn
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson + Sheridan, LLP
- 优先权: IN201841003399 20180130
- 主分类号: H01J37/04
- IPC分类号: H01J37/04 ; H01L21/67 ; H01J37/32 ; H01J37/20
摘要:
In one example, a chamber inlet assembly includes a chamber inlet, an outer coupling for a delivery line, and an inner coupling for a processing region of a processing chamber. The inner coupling and the outer coupling are on inner and outer ends, respectively, of the chamber inlet, wherein a cross-sectional area of the inner coupling is larger than a cross-sectional area of the outer coupling. The chamber inlet assembly also includes a longitudinal profile including the inner and outer ends and a first side and a second side, the first and second sides being on opposite sides of the chamber inlet, wherein a shape of the longitudinal profile comprises at least one of triangular, modified triangular, trapezoidal, modified trapezoidal, rectangular, modified rectangular, rhomboidal, and modified rhomboidal. The chamber inlet assembly also includes cassette including the chamber inlet and configured to set into a side wall of the processing chamber.
公开/授权文献
- US20210074505A1 SIDE INJECT DESIGNS FOR IMPROVED RADICAL CONCENTRATIONS 公开/授权日:2021-03-11
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