- 专利标题: Method for fabricating semiconductor package
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申请号: US17037003申请日: 2020-09-29
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公开(公告)号: US11322368B2公开(公告)日: 2022-05-03
- 发明人: Jung-Ho Park , Jin-Woo Park , Seok Hyun Lee , Jae Gwon Jang , Gwang Jae Jeon
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR10-2020-0018400 20200214
- 主分类号: H01L21/48
- IPC分类号: H01L21/48 ; H01L21/52 ; H01L25/00 ; H01L21/56 ; H01L23/498
摘要:
A method for fabricating a semiconductor package, the method including: forming a release layer on a first carrier substrate, wherein the release layer includes a first portion and a second portion, wherein the first portion has a first thickness, and the second portion has a second thickness thicker than the first thickness; forming a barrier layer on the release layer; forming a redistribution layer on the barrier layer, wherein the redistribution layer includes wirings and an insulating layer; mounting a semiconductor chip on the redistribution layer; forming a molding layer on the redistribution layer to at least partially surround the semiconductor chip; attaching a second carrier substrate onto the molding layer; removing the first carrier substrate and the release layer; removing the barrier layer; and attaching a solder ball onto the redistribution layer exposed by removal of the barrier layer and the second portion of the release layer.
公开/授权文献
- US20210257223A1 METHOD FOR FABRICATING SEMICONDUCTOR PACKAGE 公开/授权日:2021-08-19
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