- 专利标题： Plasma reactor with highly symmetrical four-fold gas injection
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申请号： US16226536申请日： 2018-12-19
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公开(公告)号： US11244811B2公开(公告)日： 2022-02-08
- 发明人: Yan Rozenzon , Kyle Tantiwong , Imad Yousif , Vladimir Knyazik , Bojenna Keating , Samer Banna
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Fish & Richardson P.C.
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; C23C16/455
摘要：
An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.
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