- 专利标题: Measuring apparatus and method of setting observation condition
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申请号: US16486422申请日: 2017-05-12
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公开(公告)号: US11043358B2公开(公告)日: 2021-06-22
- 发明人: Ryoko Araki , Natsuki Tsuno , Yohei Nakamura , Masahiro Sasajima , Mitsuhiro Nakamura , Toshihide Agemura
- 申请人: HITACHI HIGH-TECH CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECH CORPORATION
- 当前专利权人: HITACHI HIGH-TECH CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge, P.C.
- 优先权: JPJP2017-031694 20170223
- 国际申请: PCT/JP2017/017993 WO 20170512
- 国际公布: WO2018/154800 WO 20180830
- 主分类号: H01J37/00
- IPC分类号: H01J37/00 ; H01J37/24 ; H01J37/10 ; H01J37/244 ; H01J37/28
摘要:
A measuring apparatus that irradiates a sample with a charged particle beam to observe the sample includes a particle source that outputs the charged particle beam, a lens that collects the charged particle beam, a detector that detects a signal of emitted electrons emitted from the sample which is irradiated with the charged particle beam, and a control device that controls the output of the charged particle beam and the detection of the signal of the emitted electrons in accordance with an observation condition, in which the control device sets, as the observation condition, a first parameter for controlling an irradiation cycle of the charged particle beam, a second parameter for controlling a pulse width of the pulsed charged particle beam, and a third parameter for controlling detection timing of the signal of the emitted electron within the irradiation time of the pulsed charged particle beam, and the third parameter is determined in accordance with a difference in intensity of signals of the plurality of the emitted electrons emitted from the irradiation position of the charged particle beam.
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