发明授权
- 专利标题： Electrostatic filter and ion implanter having asymmetric electrostatic configuration
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申请号： US16197251申请日： 2018-11-20
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公开(公告)号： US10886098B2公开(公告)日： 2021-01-05
- 发明人: Alexandre Likhanskii , Frank Sinclair , Shengwu Chang , Eric D. Hermanson , Nevin H. Clay
- 申请人： APPLIED Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED Materials, Inc.
- 当前专利权人： APPLIED Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Kacvinsky Daisak Bluni PLLC
- 主分类号： H01J37/05
- IPC分类号： H01J37/05 ; H01J37/12 ; H01J37/08 ; H01J37/147 ; H01J37/317
摘要：
An apparatus may include a main chamber, an entrance tunnel, having an entrance axis extending into the main chamber, and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, on a lower side of the exit tunnel; and a catch assembly, disposed within the main chamber, in a line of sight from an exterior aperture of the exit tunnel.
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