Invention Grant
- Patent Title: Deflection sensitivity calculation method and deflection sensitivity calculation system
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Application No.: US16253767Application Date: 2019-01-22
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Publication No.: US10707048B2Publication Date: 2020-07-07
- Inventor: Ryo Tajima
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@21c4386e
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/20 ; H01J37/30 ; H01J37/302 ; H01J37/317 ; H01J37/06

Abstract:
According to one embodiment, provided is a deflection sensitivity calculation method for calculating deflection sensitivity of a deflector in an electron beam irradiation apparatus that irradiates an irradiation object on a stage with an electron beam by causing the deflector to deflect the electron beam, the deflection sensitivity calculation method including: irradiating an area that covers an adjustment plate with an electron beam by scanning a deflection parameter that controls deflection of the deflector in a predetermined width; detecting a current value detected from the adjustment plate; forming an image corresponding to the detected current value, a number of pixels of the image being known; calculating the number of pixels of a portion corresponding to the adjustment plate in the formed image; and calculating the deflection sensitivity of the deflector.
Public/Granted literature
- US20190237293A1 DEFLECTION SENSITIVITY CALCULATION METHOD AND DEFLECTION SENSITIVITY CALCULATION SYSTEM Public/Granted day:2019-08-01
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