Invention Grant
- Patent Title: Gas abatement apparatus
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Application No.: US16055929Application Date: 2018-08-06
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Publication No.: US10675581B2Publication Date: 2020-06-09
- Inventor: Adib Khan , Qiwei Liang , Sultan Malik , Srinivas Nemani , Rafika Smati , Joseph Ng , John O'Hehir
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/673
- IPC: H01L21/673 ; B01D53/047 ; B01D53/04 ; H01L21/67

Abstract:
Embodiments of the present disclosure relate to gas abatement apparatus and effluent management. The apparatus described herein include a high pressure process chamber and a containment chamber surrounding the process chamber. A high pressure fluid delivery module is in fluid communication with the high pressure process chamber and is configured to deliver a high pressure fluid to the process chamber. An effluent management module includes a muffler assembly to effluent pressure reduction and a plurality of scrubbers provide for treatment of effluent.
Public/Granted literature
- US20200038797A1 GAS ABATEMENT APPARATUS Public/Granted day:2020-02-06
Information query
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