- 专利标题: Ultra-high sensitivity hybrid inspection with full wafer coverage capability
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申请号: US16272905申请日: 2019-02-11
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公开(公告)号: US10545099B1公开(公告)日: 2020-01-28
- 发明人: Grace Chen , Lawrence Muray
- 申请人: KLA-TENCOR CORPORATION
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Kwan & Olynick LLP
- 主分类号: G01N21/956
- IPC分类号: G01N21/956 ; G01N21/95 ; G03F7/20 ; H01J37/20 ; H01J37/28
摘要:
Disclosed are apparatus and methods for detecting defects on a semiconductor sample. An optical inspector is first used to inspect a semiconductor sample with an aggressively predefined threshold selected to detect candidate defect and nuisance sites at corresponding locations across the sample. A high-resolution distributed probe inspector includes an array of miniature probes that are moved relative to the sample to scan and obtain a high-resolution image of each site to detect and separate the candidate defect sites from the nuisance sites. A higher-resolution probe is then used to obtain a higher-resolution image of each candidate site to obtain a high-resolution image of each site to separate real defects that adversely impact operation of any devices on the sample from the candidate defects.
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