- 专利标题: Semiconductor device with low lifetime region
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申请号: US15961568申请日: 2018-04-24
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公开(公告)号: US10535729B2公开(公告)日: 2020-01-14
- 发明人: Mitsuhiro Kakefu
- 申请人: FUJI ELECTRIC CO., LTD.
- 申请人地址: JP Kawasaki-shi, Kanagawa
- 专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人: FUJI ELECTRIC CO., LTD.
- 当前专利权人地址: JP Kawasaki-shi, Kanagawa
- 代理机构: Rabin & Berdo, P.C.
- 优先权: JP2012-271031 20121212; JP2013-230902 20131107
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/32 ; H01L29/861 ; H01L29/10
摘要:
In a semiconductor device including a low lifetime region of a depth within a range on both sides sandwiching a p-n junction of a p-type semiconductor region bottom portion, the low lifetime region includes a central region that has a portion coinciding with the semiconductor region as seen from one main surface side and is selectively formed as far as the position of a contact end portion of a region of the coinciding portion with which the semiconductor region and a metal electrode are in contact, a peripheral region wherein the central region extends as far as the position of an outer peripheral end of the semiconductor region, and an expanded end portion region wherein the peripheral region extends as far as an outer peripheral end of the innermost of guard rings. Because of this, it is possible to reduce leakage current while maintaining high reverse recovery current resistance.
公开/授权文献
- US20180240866A1 SEMICONDUCTOR DEVICE WITH LOW LIFETIME REGION 公开/授权日:2018-08-23
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