- 专利标题: Metrology systems with multiple derivative modules for substrate stress and deformation measurement
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申请号: US16080102申请日: 2017-03-09
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公开(公告)号: US10510624B2公开(公告)日: 2019-12-17
- 发明人: Mehdi Vaez-Iravani , Todd Egan , Samer Banna , Kyle Tantiwong
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson + Sheridan, LLP
- 国际申请: PCT/US2017/021638 WO 20170309
- 国际公布: WO2017/172324 WO 20171005
- 主分类号: G01B11/24
- IPC分类号: G01B11/24 ; H01L21/66 ; G02B27/12
摘要:
Embodiments of the disclosure provide a metrology system. In one example, a metrology system includes a laser source adapted to transmit a light beam, a lens adapted to receive at least a portion of the light beam from the laser source, a first beam splitter positioned to receive at least the portion of the light beam passing through the lens, a first beam displacing device adapted to cause a portion of the light beam received from the beam splitter to be split into two or more sub-light beams a first recording device having a detection surface, and a first polarizer that is positioned between the first displacing device and the first recording device, wherein the first polarizer is configured to cause the two or more sub-light beams provided from the first displacing device to form an interference pattern on the detection surface of the first recording device.
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