- 专利标题: Semiconductor devices, semiconductor packages, and methods of manufacturing the semiconductor devices
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申请号: US15870044申请日: 2018-01-12
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公开(公告)号: US10325869B2公开(公告)日: 2019-06-18
- 发明人: Ju-il Choi , Kwang-jin Moon , Ju-bin Seo , Dong-chan Lim , Atsushi Fujisaki , Ho-jin Lee
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel, P.A.
- 优先权: KR10-2017-0093692 20170724
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/00 ; H01L23/31 ; H01L25/065
摘要:
A semiconductor device includes a conductive component on a substrate, a passivation layer on the substrate and including an opening that exposes at least a portion of the conductive component, and a pad structure in the opening and located on the passivation layer, the pad structure being electrically connected to the conductive component. The pad structure includes a lower conductive layer conformally extending on an inner sidewall of the opening, the lower conductive layer including a conductive barrier layer, a first seed layer, an etch stop layer, and a second seed layer that are sequentially stacked, a first pad layer on the lower conductive layer and at least partially filling the opening, and a second pad layer on the first pad layer and being in contact with a peripheral portion of the lower conductive layer located on the top surface of the passivation layer
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