Invention Grant
- Patent Title: Semiconductor device with schottky diode and manufacturing method thereof
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Application No.: US15242684Application Date: 2016-08-22
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Publication No.: US10224321B2Publication Date: 2019-03-05
- Inventor: Francois Hebert
- Applicant: MagnaChip Semiconductor, Ltd.
- Applicant Address: KR Cheongju-si
- Assignee: MagnaChip Semiconductor, Ltd.
- Current Assignee: MagnaChip Semiconductor, Ltd.
- Current Assignee Address: KR Cheongju-si
- Agency: NSIP Law
- Priority: KR10-2013-0058445 20130523
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L27/07 ; H01L29/772 ; H01L29/872 ; H01L29/417 ; H01L29/423 ; H01L29/78 ; H01L29/06 ; H01L29/08 ; H01L29/10 ; H01L29/49

Abstract:
A semiconductor device with an embedded schottky diode and a manufacturing method thereof are provided. A semiconductor device having a schottky diode include: an epilayer of a first conductivity type, a body layer of a second conductivity type, and a source layer of the first conductivity type arranged in that order; a gate trench that extends from the source layer to a part of the epilayer; a body trench formed a predetermined distance from the gate trench and extends from the source layer to a part of the epilayer; and a guard ring of the second conductivity type that contacts an outer wall of the body trench and formed in the epilayer.
Public/Granted literature
- US20160358906A1 SEMICONDUCTOR DEVICE WITH SCHOTTKY DIODE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-12-08
Information query
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