- 专利标题: Method and apparatus for controlling a magnetic field in a plasma chamber
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申请号: US15437757申请日: 2017-02-21
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公开(公告)号: US10115566B2公开(公告)日: 2018-10-30
- 发明人: Steven Lane , Tza-Jing Gung , Kartik Ramaswamy , Travis Koh , Joseph F. Aubuchon , Yang Yang
- 申请人: APPLIED MATERIALS, INC.
- 申请人地址: US CA Santa Clara
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Moser Taboada
- 代理商 Alan Taboada
- 主分类号: H01J37/32
- IPC分类号: H01J37/32
摘要:
Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.
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