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发明授权
CN1794089B 具有二维对准测量装置的光刻设备和二维对准测量方法 有权

具有二维对准测量装置的光刻设备和二维对准测量方法
摘要：
光刻设备具有用来移动带有标记(M3)的对象的执行器，所述标记具有多个排列成行和列的结构(19)。对准装置包括光源、光学系统和检测器。光源和光学系统产生在与列平行的第一方向延伸的第一斑点部分(24x)和在与行平行的第二方向延伸的第二斑点部分(24y)。光学系统把对准辐射束射向标记(M3)，接收从标记(M3)返回的对准辐射，并把对准辐射传送给检测器。检测器把对准信号传送给处理器，处理器根据对准信号计算标记(M3)的二维位置。
摘要（英）：

A lithographic apparatus having an actuator to move an object with a mark that includes a plurality of structures arranged in rows and columns. An alignment arrangement has a light source, optics andadetector. The light source and the optics produce an alignment beam with a first spot portion extending in a first direction that is parallel to the columns and a second spot portion extending in ase cond direction that is parallel to the rows. The optics direct the alignment beam to the mark, receive alignment radiation back from the mark and transmit the alignment radiation to the detector. The detector transmits an alignment signal to a processor that calculates a two-dimensional position of the mark based on the alignment signal.

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