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CN110337714A 用以减少电弧的氦气插塞设计 审中-实审

用以减少电弧的氦气插塞设计
摘要：
一种衬底支撑件包括：基板；陶瓷层，其布置在所述基板上；结合层，其布置在所述基板和所述陶瓷层之间的第一间隙中；通道，其穿过所述基板、所述结合层和所述陶瓷层形成；和插塞，其布置在所述通道中。所述插塞包括布置在所述基板中的下部和布置在所述陶瓷层中的上部。所述下部包括凹穴和围绕所述凹穴的侧壁。所述上部在所述陶瓷层和所述第一间隙下方延伸到所述凹穴中，所述下部的所述侧壁与所述上部重叠，以及所述上部和所述下部之间的第二间隙位于所述第一间隙下方的所述下部的所述凹穴内。
摘要（英）：

A substrate support includes a baseplate, a ceramic layer arranged on the baseplate, a bond layer arranged in a first gap between the baseplate and the ceramic layer, a channel formed through the baseplate, the bond layer, and the ceramic layer, and a plug arranged in the channel. The plug includes a lower portion arranged in the baseplate and an upper portion arranged in the ceramic layer. The lower portion includes a pocket and sidewalls surrounding the pocket. The upper portion extends below the ceramic layer and the first gap into the pocket, the sidewalls of the lower portion overlap theupper portion, and a second gap between the upper portion and the lower portion is located within the pocket of the lower portion below the first gap.

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