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发明公开
CN110083019A 光学元件、辐射系统及光刻系统 有权

光学元件、辐射系统及光刻系统
摘要：
本申请公开了一种光学元件、辐射系统及光刻系统。该光学元件包括：主体；反射性表面，所述反射性表面设置于所述主体上以用于接收辐射束以便形成束斑区域和反射的辐射束；和移动机构，所述移动机构能够操作以移动所述主体使得所述束斑区域遵循周期性路径在所述反射性表面上移动，并且所述反射的辐射束的方向实质上保持不变；用于更改所述反射性表面的曲率的变形机构，其中所述变形机构被布置成更改所述反射性表面的所述曲率以便至少部分地校正由入射于所述反射性表面上的所述辐射束所导致的所述反射性表面的曲率。
摘要（英）：

The application discloses an optical element, a radiation system and a lithographic system. The optical element comprises a body; a reflective surface disposed on the body for receiving a beam of radiation to form a beam spot region and a reflected beam of radiation; and a moving mechanism operable to move the body such that the beam spot region moves over the reflective surface following a periodic path, and the direction of the reflected beam of radiation remains substantially unchanged; a deformation mechanism for modifying the curvature of the reflective surface, wherein the deformation mechanism is arranged to modify the curvature of the reflective surface to at least partially correct a curvature of the reflective surface caused by the beam of radiation incident on the reflective surface.

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