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发明公开
CN102566274A 正型光敏树脂组合物，利用其制备的光敏树脂膜，和包括该光敏树脂膜的半导体器件 失效 - 权利终止

正型光敏树脂组合物，利用其制备的光敏树脂膜，和包括该光敏树脂膜的半导体器件
摘要：
本发明公开了一种正型光敏树脂组合物，包括：(A)碱溶性树脂；(B)包括由化学式6表示的化合物的溶解控制剂；(C)光敏重氮醌化合物；(D)硅烷化合物；和(E)溶剂，以及使用该正型光敏树脂组合物制备的光敏树脂膜和该光敏树脂膜的半导体器件。本发明的正型光敏树脂组合物具有优异的膜残留率、敏感度和分辨率。[化学式6]
摘要（英）：

Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent. Also disclosed are a photosensitive resin film prepared by using the positive photosensitive resin composition and a semiconductor device including the photosensitive resin film. The positive photosensitive resin composition of the invention has excellent film residue ratio, sensitivity and resolution. The Chemical Formula 6 is shown in the description.

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