The invention provides a manufacture method of a silicon chip, which comprises the steps of: cutting a silicon ingot into silicon blocks with preset surface roughness by using silicon ingot cutting slurry, and cutting the silicon blocks into silicon chips respectively with preset thicknesses, wherein the silicon ingot cutting slurry contains grains and alkaline matters, the slurry contains organic amine with mass ratio being above 0.5 and less than 5.0 of water relative to the liquid content of the slurry, the pH value of the slurry is above 12, the slurry is used at a temperature above 65 DEG C and below 95 DEG C, and the preset surface roughness is set below a higher limit of an area in which the improvement ratio of the damage of a substrate is above 80 percent.