The invention discloses a method for reducing photoetching alignment deviation caused by distortion of a lens of a photoetching machine. The method comprises the following steps: measuring position change caused by distortion of the lens on the top, bottom, left and right positions of an exposing unit through generating symmetrical photoetching alignment figures around the same exposing unit; andthen selecting a proper photoetching alignment model according to requirement of distortion adjusting accuracy of the lens of the photoetching machine to calculate distortion amount of the lens, and correcting the distortion amount through photoetching alignment parameters at each time of exposure. Therefore, the method achieves reduction of the photoetching alignment deviation caused by the distortion of the lens of the photoetching machine and improvement in the photoetching alignment accuracy. At the same time, the method finds a simple matching standard for different products on differentphotoetching machines, and can keep unity of final products produced by the photoetching machines with different lenses, so as to improve productivity greatly. And the method is easy to achieve, and has low cost.