公开(公告)号：US11632849B2

公开(公告)日：2023-04-18

申请号：US17460144

申请日：2021-08-27

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： Chieh Hsieh ,  Tai-Yu Chen ,  Hung-Jung Hsu ,  Cho-Ying Lin ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC分类号： G03F7/20 ,  H05G2/00

摘要： A shutter is provided near the immediate focus of a lithography apparatus in order to deflect tin debris generated by a source side of the apparatus away from a scanner side of the apparatus and towards a debris collection device. The activation of the shutter is synchronized with the generation of light pulses so as not to block light from entering the scanner side.

公开(公告)号：US20230101779A1

公开(公告)日：2023-03-30

申请号：US17812924

申请日：2022-07-15

申请人： GIGAPHOTON INC.

发明人： Yuichi NISHIMURA ,  Yoshifumi UENO

IPC分类号： G01N21/33 ,  H05G2/00

摘要： An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.

公开(公告)号：US11617256B2

公开(公告)日：2023-03-28

申请号：US17138764

申请日：2020-12-30

申请人： KLA Corporation

发明人： Jian Xu ,  Lauren Wilson

IPC分类号： H05G2/00 ,  G03F7/20

摘要： A broadband light source includes a rotatable drum coated with plasma-forming target material, a rotational actuator configured to rotate the rotatable drum, and a rotary encoder connected to the rotatable drum. The broadband light source may include a linear actuator configured to axially translate the rotatable drum and linear encoder connected to the rotatable drum. The broadband light source includes a pulsed laser source configured to direct pulsed illumination to a set of spots on the material-coated portion of the rotatable drum for exciting the plasma-forming target material and emitting broadband light as the drum is actuated. The broadband light source includes a control system. The control system is configured to receive one or more rotational position indicators from the rotary indicator and control triggering of the laser source based on the one or more rotational position indicators from rotary encoder.

公开(公告)号：US20230091648A1

公开(公告)日：2023-03-23

申请号：US18070155

申请日：2022-11-28

申请人： ASML Netherlands B.V.

发明人： Sander Catharina Reinier DERKS ,  Daniel Jozef Maria DIRECKS ,  Maurice Wilhelmus Leonardus Hendricus FEIJTS ,  Pieter Gerardus Mathijs HOEIJMAKERS ,  Katja Cornelia Joanna Clasina MOORS ,  Violeta NAVARRO PAREDES ,  William Peter VAN DRENT ,  Jan Steven Christiaan WESTERLAKEN

IPC分类号： G03F7/20 ,  H05G2/00

摘要： A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.

公开(公告)号：US11606856B2

公开(公告)日：2023-03-14

申请号：US17691860

申请日：2022-03-10

申请人： AweXome Ray, Inc. ,  Sang Soo Kim

发明人： Sang Soo Kim ,  Hong Soo Choi ,  Se Hoon Gihm

IPC分类号： H05G1/32 ,  H01J35/08 ,  H05G1/26 ,  H05G1/34

摘要： Disclosed is an electromagnetic wave generator, comprising a tube comprising an anode, a cathode and at least one gate, a tube power supply circuit in which one side of an output terminal is connected to the anode, and the other side of the output terminal is connected to the cathode, and a gate controlling circuit in which at least one side of the output terminal is connected to the gate, wherein a first voltage value of one side of the output terminal of the tube power supply circuit and a second voltage value of the other side of the output terminal of the tube power supply circuit are different from each other with respect to a ground terminal of the tube power supply circuit.

公开(公告)号：US11599030B2

公开(公告)日：2023-03-07

申请号：US17336249

申请日：2021-06-01

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Shih-Yu Tu ,  Po-Chung Cheng ,  Hsiao-Lun Chang ,  Li-Jui Chen ,  Han-Lung Chang

IPC分类号： G03F7/20 ,  H05G2/00

摘要： A droplet catcher system of an EUV lithography apparatus is provided. The droplet catcher system includes a catcher body, a heat transfer part, a heat exchanger, and a controller. The catcher body has an outer surface. The heat transfer part is directly attached to the outer surface of the catcher body. The heat exchanger is thermally coupled to the heat transfer part. The controller is electrically coupled to the heat exchanger.

公开(公告)号：US20230065403A1

公开(公告)日：2023-03-02

申请号：US17462563

申请日：2021-08-31

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Tai-Yu CHEN ,  Cho-Ying LIN ,  Sagar Deepak KHIVSARA ,  Hsiang CHEN ,  Chieh HSIEH ,  Sheng-Kang YU ,  Shang-Chieh CHIEN ,  Kai Tak LAM ,  Li-Jui CHEN ,  Heng-Hsin LIU ,  Zhiqiang WU

IPC分类号： H05G2/00 ,  G03F7/20

摘要： A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.

公开(公告)号：US11589447B2

公开(公告)日：2023-02-21

申请号：US17224605

申请日：2021-04-07

申请人： ENERGY RESOURCES INTERNATIONAL CO., LTD.

发明人： Tsung-Min Yang ,  Hung-Chiang Huang

IPC分类号： H05G1/20 ,  H05G1/54 ,  H05G1/32

摘要： A method and a device for driving high-voltage X ray tube with positive and negative pulses are disclosed comprises a microprocessor unit having a first output port and a second output port, respectively outputting a first and a second timing sequence of control signals, a high-voltage X ray tube, a first high-frequency voltage boost circuit outputting a first regulated high-voltage, a first high-voltage protection circuit, a second high-frequency voltage boost circuit outputting a second high-voltage, and a second high-voltage protection circuit. The first high and the second voltages are respectively, regulated by the first timing sequence of control signal and the second timing sequence of control signal. Both regulated high-voltages are, respectively, inputted to anode and cathode of the high-voltage X ray tube vias the high-voltage protected circuits.

公开(公告)号：US20230046424A1

公开(公告)日：2023-02-16

申请号：US17691471

申请日：2022-03-10

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Hyeon Jin KIM ,  Sung Hyup KIM ,  Jeong-Gil KIM ,  Jeong Du KIM ,  Sang Hoon LEE ,  In Jae LEE ,  Jong Gu LEE

IPC分类号： H05G2/00 ,  G03F7/20 ,  H01L21/3065 ,  H01L21/027

摘要： An extreme ultraviolet light generator includes a collector including a first focus and a second focus, a droplet feeder configured to provide a source droplet toward the first focus of the collector, a laser generator configured to irradiate a laser toward the first focus of the collector, an airflow controller between the first focus and the second focus of the collector, the airflow controller having a ring shape, and the airflow controller including at least one slit, and a first part and a second part hinged to each other, and a control gas feeder configured to provide a control gas towards the at least one slit of the airflow controller.

公开(公告)号：US11576250B1

公开(公告)日：2023-02-07

申请号：US17445430

申请日：2021-08-19

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Cheng-Hao Lai ,  Ming-Hsun Tsai ,  Hsin-Feng Chen ,  Wei-Shin Cheng ,  Yu-Kuang Sun ,  Cheng-Hsuan Wu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC分类号： H05G2/00 ,  G03F7/20

摘要： Some implementations described herein provide techniques and apparatuses for an extreme ultraviolet (EUV) radiation source that includes a backsplash-prevention system to reduce, minimize, and/or prevent the formation of tin (Sn) build-up in a tunnel structure of a collector flow ring that might otherwise be caused by the accumulation of Sn satellites. This reduces backsplash of Sn onto a collector of the EUV radiation source, increases the operational life of the collector (e.g., by increasing the time duration between cleaning and/or replacement of the collector), reduces downtime of the EUV radiation source, and/or enables the performance of the EUV radiation source to be sustained for longer time durations (e.g., by reducing, minimizing, and/or preventing the rate of Sn contamination of the collector), among other examples.