公开(公告)号：US06573022B1

公开(公告)日：2003-06-03

申请号：US09173719

申请日：1998-10-16

Applicant: Hideo Miyake ,  Ikuo Kawauchi

Inventor： Hideo Miyake ,  Ikuo Kawauchi

IPC: G03C152

CPC classification number: B41C1/1016 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/106 ,  Y10S430/145

Abstract: A positive image-forming material for use with infrared laser is provided. The material includes a substrate, a layer (A) containing not less than 50% by weight of a copolymer which contains, as a copolymerization component, not less than 10% by mol of at least one of the following monomers (a-1) to (a-3), wherein (a-1) is a monomer having in the molecule a sulfonamide group wherein at least one hydrogen atom is linked to a nitrogen atom, (a-2) is a monomer having in the molecule an active imino group represented by the following general formula (I): and (a-3) is a monomer selected from acrylamide, methacrylamide, acrylate, methacrylate and hydroxystyrene, which respectively have a phenolic hydroxyl group; and a layer (B) containing not less than 50% by weight of an aqueous alkali solution-soluble resin having a phenolic hydroxyl group. The layer (A) and the layer (B) contain a compound which generates heat upon absorbing light. An image forming material includes the following compounds (II) and (III): R1—SO2—SO2—R2  (II) R1—SO2—R2  (III) wherein R1 and R2 may be the same or different, and R1 and R2 represent a substituted or non-substituted alkyl, alkenyl or aryl group. The photosensitive image-forming material and positive photosensitive composition have excellent stability of sensitivity with regard to concentration of a developing solution, i.e., have excellent development latitude.

Abstract translation: 提供了用于红外激光的正成像材料。 该材料包括基材，含有不少于50重量％的共聚物的层（A），其含有作为共聚组分的至少一种下列单体（a-1）不少于10摩尔％ 至（a-3），其中（a-1）是在分子中具有至少一个氢原子与氮原子连接的磺酰胺基的单体，（a-2）是在分子中具有活性的单体 由以下通式（I）表示的亚氨基：（a-3）是选自丙烯酰胺，甲基丙烯酰胺，丙烯酸酯，甲基丙烯酸酯和羟基苯乙烯的单体，分别具有酚羟基; 和含有不少于50重量％的具有酚羟基的碱溶性水溶性树脂的层（B）。 层（A）和层（B）含有在吸收光时产生热的化合物。 图像形成材料包括以下化合物（II）和（III）：其中R 1和R 2可以相同或不同，并且R 1和R 2表示取代或未取代的烷基，烯基或芳基。 感光性图像形成材料和正性感光性组合物对于显影液的浓度具有优异的灵敏度稳定性，即具有优异的显影性。

公开(公告)号：US06342333B1

公开(公告)日：2002-01-29

申请号：US09401196

申请日：1999-09-23

Applicant: Akihiro Sasaki ,  Noriyoshi Arai ,  Makoto Kaji ,  Toshiki Hagiwara ,  Brian C. Auman

Inventor： Akihiro Sasaki ,  Noriyoshi Arai ,  Makoto Kaji ,  Toshiki Hagiwara ,  Brian C. Auman

IPC: G03C152

CPC classification number: C08G73/10 ,  G03F7/038 ,  G03F7/0387 ,  H05K3/4676

Abstract: A photosensitive resin composition comprising an aromatic polyimide precursor, wherein a 10 &mgr;m thick layer of precursor has light transmittance at a wavelength of 365 nm of at least 1% and a 10 &mgr;m thick polyimide film made from the resin composition by imidation ring closure and deposited on a silicon substrate results in a residual stress of at most 25 MPa. The composition can be patterned through i-line exposure followed by development with alkaline solutions, and can be imidized into low-stress polyimide patterns. Electronic components having the polyimide patterns have high reliability.

Abstract translation: 一种包含芳族聚酰亚胺前体的感光性树脂组合物，其中10μm厚的前体层具有至少1％的365nm波长的透光率和10μm厚的聚酰亚胺膜，该树脂组合物通过酰亚胺化闭合和沉积 在硅衬底上导致至多25MPa的残余应力。 组合物可以通过i线曝光进行图案化，然后用碱性溶液显影，并且可以被酰亚胺化成低应力聚酰亚胺图案。 具有聚酰亚胺图案的电子元件具有高可靠性。

公开(公告)号：US06340551B1

公开(公告)日：2002-01-22

申请号：US09421535

申请日：1999-10-20

Applicant: Hideo Miyake ,  Ikuo Kawauchi

Inventor： Hideo Miyake ,  Ikuo Kawauchi

IPC: G03C152

CPC classification number: B41C1/1016 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/106 ,  Y10S430/145

Abstract: A positive type photosensitive image-forming material for use with an infrared laser is provided. The material includes a substrate, a layer (A) containing not less than 50% by weight of a copolymer which contains, as a copolymerization component, not less than 10% by mol of at least one of the following monomers (a-1) to (a-3), wherein (a-1) is a monomer having in the molecule a sulfonamide group wherein at least one hydrogen atom is linked to a nitrogen atom, (a-2) is a monomer having in the molecule an active imino group represented by the following general formula (I): and (a-3) is a monomer selected from acrylamide, methacrylamide, acrylate, methacrylate and hydroxystyrene, which respectively have a phenolic hydroxyl group; and a layer (B) containing not less than 50% by weight of an aqueous alkali solution-soluble resin having a phenolic hydroxyl group. The layer (A) and the layer (B) are laminated on the substrate in that order. At least the layer (B) contains a compound which generates heat upon absorbing light. The image-forming material has excellent stability of sensitivity with regard to concentration of a developing solution, i.e., has excellent development latitude.

Abstract translation: 提供了一种用于红外激光的正型光敏图像形成材料。 该材料包括基材，含有不少于50重量％的共聚物的层（A），其含有作为共聚组分的至少一种下列单体（a-1）不少于10摩尔％ 至（a-3），其中（a-1）是在分子中具有至少一个氢原子与氮原子连接的磺酰胺基的单体，（a-2）是在分子中具有活性的单体 由以下通式（I）表示的亚氨基：（a-3）是选自丙烯酰胺，甲基丙烯酰胺，丙烯酸酯，甲基丙烯酸酯和羟基苯乙烯的单体，分别具有酚羟基; 和含有不少于50重量％的具有酚羟基的碱溶性水溶性树脂的层（B）。 层（A）和层（B）按顺序层压在基板上。 至少层（B）含有在吸收光时产生热的化合物。 成像材料在显影液的浓度方面具有优异的灵敏度稳定性，具有优异的显影性。

公开(公告)号：US06733948B2

公开(公告)日：2004-05-11

申请号：US09928447

申请日：2001-08-14

Applicant: Ippei Nakamura ,  Tadahiro Sorori

Inventor： Ippei Nakamura ,  Tadahiro Sorori

IPC: G03C152

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/465

Abstract: A negative image-recording material which can be imagewise exposed to IR radiation from IR lasers and ensures direct image formation from digital data of a computer or the like. The material, when used in a lithographic printing plate, ensures good hardenability in an image area and exhibits good printing durability, even if not heated for image formation, and ensures a large number of good prints from the printing plate. The recording material contains (A) an IR absorber, (B) a radical generator having an onium salt structure, (C) a radical-polymerizing compound, and (D) a reducing additive, and this is imagewise exposed to IR radiation for image formation. Preferably, the reducing additive (D) is highly reactive with radicals and a reaction product with a radical has high reductivity. Preferred examples of the reducing additive are ether-type hydrogen donors, alcohol-type hydrogen donors, vinyl ethers and phosphine-type compounds.

Abstract translation: 可以从IR激光器成像曝光到IR辐射的负图像记录材料，并确保从计算机等的数字数据直接形成图像。 该材料在平版印刷版中使用时，确保图像区域的良好的淬透性，并且即使不加热成像，也能保证印刷品的良好印刷，因此具有良好的印刷耐久性。 记录材料包含（A）IR吸收剂，（B）具有鎓盐结构的自由基发生剂，（C）自由基聚合化合物和（D）还原添加剂，并且其成像暴露于IR辐射图像 形成。 优选地，还原添加剂（D）与自由基具有高反应性，并且与基团的反应产物具有高的还原性。 还原添加剂的优选实例是醚型氢供体，醇型氢供体，乙烯基醚和膦类化合物。

公开(公告)号：US06558872B1

公开(公告)日：2003-05-06

申请号：US09658548

申请日：2000-09-09

Applicant: Kevin Barry Ray ,  Anthony Paul Kitson ,  Eduard Kottmair ,  Hans-Horst Glatt ,  Stefan Hilgart

Inventor： Kevin Barry Ray ,  Anthony Paul Kitson ,  Eduard Kottmair ,  Hans-Horst Glatt ,  Stefan Hilgart

IPC: G03C152

CPC classification number: G03F1/68 ,  G03F7/023 ,  H05K3/0076 ,  H05K3/0082 ,  Y10S430/106 ,  Y10S430/145

Abstract: Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infra-red absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.

Abstract translation: 用于掩模和电子部件的可能的前体包括施加到基底上的聚合物层。 该层包含至少一种聚合物，其具有在聚合物主链上作为悬挂基团携带的红外线吸收基团。 某些红外线吸收基团还可以起作用以使显影剂中的聚合物不溶解，直到其成像曝光于红外辐射。 由于将前体成像曝光到红外辐射而产生的图像上的热量使得聚合物层比暴露于红外线辐射之前更易于在显影剂中溶解。

公开(公告)号：US06383708B1

公开(公告)日：2002-05-07

申请号：US08160290

申请日：1993-12-02

Applicant: Yasunori Uetani ,  Yasunori Doi ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki ,  Ryotaro Hanawa

Inventor： Yasunori Uetani ,  Yasunori Doi ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki ,  Ryotaro Hanawa

IPC: G03C152

CPC classification number: G03F7/0048 ,  G03F7/0226

Abstract: A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.

Abstract translation: 一种正性抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和（B）至少一种选自γ-丁内酯，3-甲氧基丁醇和环己酮的至少一种有机溶剂和（A ）除了在大气压（B）下在分子中不具有烷基羰基和烷氧基并且沸点为140〜180℃的溶剂（B）的有机溶剂，该组合物具有 大的伽马值，并提供改进的轮廓和较大的焦点深度。