公开(公告)号：US06705125B2

公开(公告)日：2004-03-16

申请号：US09916847

申请日：2001-07-26

申请人： John E. Peterson ,  Stephen M. Maricle ,  Raymond M. Brusasco ,  Bernardino M. Penetrante

发明人： John E. Peterson ,  Stephen M. Maricle ,  Raymond M. Brusasco ,  Bernardino M. Penetrante

IPC分类号： C03B3200

CPC分类号： C03C23/002 ,  C03C23/0025

摘要： The present invention provides a method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects and are better capable of resisting optical deterioration upon exposure for a long period of time to a high-power laser beam having a wavelength of about 360 nm or less. The initiation of laser-induced damage is reduced by conditioning the optic at low fluences below levels that normally lead to catastrophic growth of damage. When the optic is then irradiated at its high fluence design limit, the concentration of catastrophic damage sites that form on the surface of the optic is greatly reduced.

摘要翻译： 本发明提供了一种降低熔融二氧化硅光学元件表面上易发生激光诱发损伤的位置的密度的方法，导致光学器件具有远远更少的灾难性缺陷并且能够更好地抵抗暴露时的光学劣化 长时间地使用波长约360nm以下的大功率激光束。 激光诱发的损伤的发生通过将光学元件调节到低通常导致灾难性损伤生长的水平以下而减少。 当光学器件以其高注量设计极限照射时，形成在光学器件表面上的灾难性损伤部位的浓度大大降低。

公开(公告)号：US06374640B1

公开(公告)日：2002-04-23

申请号：US09529137

申请日：2000-08-02

申请人： Ulrich Fotheringham ,  Dirk Sprenger ,  Heinrich Ostendarp ,  Holger Wegener ,  Wolfgang Buergel ,  Eva Hoelzel

发明人： Ulrich Fotheringham ,  Dirk Sprenger ,  Heinrich Ostendarp ,  Holger Wegener ,  Wolfgang Buergel ,  Eva Hoelzel

IPC分类号： C03B3200

CPC分类号： C03B32/00

摘要： A simple and economical method is described for compacting or shrinking flat glass panes. The method ensures high temperature homogeneity in the glass. First, the glass panes are cleaned and then a stack of glass panes to be treated is assembled without applying a release agent to any of the glass panes. Then the stack of glass panes is placed between ceramic panels made of silicon-infiltrated silicon carbide and this stack together with the ceramic panels is subjected to a heat treatment in a radiation furnace at temperatures ranging from 300° C. to 900° C. The ceramic panels have a thermal conductivity, which, in the region of the heat treatment temperature, is at least 5 times as large as that of the glass panes. The ratio of the total thickness of the ceramic panels to the height of the glass stack should be at least 1/&lgr;/40W/(mK), wherein &lgr; is the thermal conductivity of the ceramic panel at the temperatures of the heat treatment.

摘要翻译： 描述了用于压实或收缩平板玻璃板的简单和经济的方法。 该方法确保玻璃中的高温均匀性。 首先，玻璃板被清洁，然后组装一堆待处理的玻璃板，而不将任何剥离剂施加到任何玻璃板上。 然后将玻璃板堆叠放置在由硅渗透的碳化硅制成的陶瓷板之间，并且将该叠层与陶瓷板一起在辐射炉中在300℃至900℃的温度范围内进行热处理。 陶瓷板具有热导率，其在热处理温度的区域中是玻璃板的至少5倍。 陶瓷板的总厚度与玻璃堆叠的高度之比应至少为1 / lambd / 40W /（mK），其中lambd是在热处理温度下陶瓷板的导热率。

公开(公告)号：US06502426B2

公开(公告)日：2003-01-07

申请号：US09997782

申请日：2001-11-28

申请人： Lisa A. Moore ,  Charlene M. Smith

发明人： Lisa A. Moore ,  Charlene M. Smith

IPC分类号： C03B3200

CPC分类号： G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

摘要： High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

摘要翻译： 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06298690B1

公开(公告)日：2001-10-09

申请号：US09578141

申请日：2000-05-24

申请人： Joel Millard Dahl ,  Millard Justin Dahl

发明人： Joel Millard Dahl ,  Millard Justin Dahl

IPC分类号： C03B3200

CPC分类号： C03B1/00 ,  Y02P40/52

摘要： A large tumbling device into which broken pieces of labeled glass such as beverage bottles, or cullet, are fed. After entering the interior chamber of the tumbler, the cullet is carried by a plurality of interior fins along the inside circumference of the tumbler to a point where the glass falls back to the low point of the tumbler. During this fall, the cullet passes through a flame generated in the interior cavity of said tumbler. The glass is heated to a temperature well below 600 degrees Fahrenheit (the temperature at which the molecular structure of glass begins to change) therefore ensuring that the processed glass retains its original properties. This process is repeated numerous times, ensuring that all of the foreign material is removed, before the cullet passes through the entirety of the chamber and is cooled to be processed into the desired grades.

摘要翻译： 一个大的翻滚装置，其中装有诸如饮料瓶或碎玻璃的标记玻璃的碎片。 在进入翻转开关的内部室之后，碎玻璃沿着转鼓的内圆周由多个内部散热片承载到玻璃落回到转鼓的低点处。 在这个秋天，碎玻璃通过在所述翻转开关的内部空腔中产生的火焰。 将玻璃加热到远低于600华氏度的温度（玻璃的分子结构开始变化的温度），从而确保加工玻璃保持其原始性能。 该过程重复多次，确保在碎玻璃通过整个室之前将所有异物除去，并被冷却以加工成所需的等级。

公开(公告)号：US06513347B1

公开(公告)日：2003-02-04

申请号：US09481392

申请日：2000-01-12

申请人： Arnaud Deschamps ,  Willi Mueller ,  Stephan Rhyner ,  Aitor Galdos

发明人： Arnaud Deschamps ,  Willi Mueller ,  Stephan Rhyner ,  Aitor Galdos

IPC分类号： C03B3200

CPC分类号： C03C17/002 ,  C03C23/007

摘要： For heat conditioning flat panel glass substrates the substrates are directly exposed in vacuum to the radiation of lamps, the lamps being selected so that their spectral radiation characteristics (b, c) fit with the absorption characteristics (a) of the glass of the substrate.

摘要翻译： 对于平板玻璃基板的热调理，将基板直接暴露于灯的辐射中，选择灯以使其光谱辐射特性（b，c）与基板玻璃的吸收特性（a）相适应。

公开(公告)号：US06430964B1

公开(公告)日：2002-08-13

申请号：US09486711

申请日：2000-07-27

申请人： Henry Dauba ,  Andre Beyrle ,  Michel Chaunac

发明人： Henry Dauba ,  Andre Beyrle ,  Michel Chaunac

IPC分类号： C03B3200

CPC分类号： C03B32/00

摘要： A method of identifying glazing that has undergone a heat treatment, consisting of fixing a substance to its surface and/or on an edge, the optical characteristic of the substance being modified at a temperature reached during the heat treatment.

摘要翻译： 一种识别经过热处理的玻璃的方法，其特征在于将物质固定在其表面和/或边缘上，所述物质的光学特性在热处理期间达到的温度下进行改性。

公开(公告)号：US06266978B1

公开(公告)日：2001-07-31

申请号：US09392427

申请日：1999-09-09

申请人： Takayuki Oshima ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Yasuyuki Yaginuma

发明人： Takayuki Oshima ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Yasuyuki Yaginuma

IPC分类号： C03B3200

CPC分类号： C03C23/0025 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/50

摘要： A simple method for producing a synthetic quartz glass having excellent homogeneity and high transmittance, which is useful as an optical material in producing steppers equipped with an ArF excimer laser as a radiation source. A method for producing a synthetic quartz glass for use in ArF excimer laser lithography, which comprises irradiating a highly homogeneous synthetic quartz glass containing less than 60 ppb of Na with ultraviolet radiation having a maximum wavelength of 260 nm for not less than the duration expressed by the equation: Y=(80X−1880)/Z wherein X represents an Na concentration (ppb), Y represents the duration of irradiation (hours), and Z represents the illuminance of an ultraviolet radiation on an irradiated surface (mW/cm2).

摘要翻译： 用于制造具有优异的均匀性和高透射率的合成石英玻璃的简单方法，其可用作制备装备有ArF准分子激光器作为辐射源的步进机中的光学材料。 一种用于制造用于ArF准分子激光光刻的合成石英玻璃的方法，其包括：将含有小于60ppb的Na的高度均匀的合成石英玻璃与最大波长为260nm的紫外线辐射照射不少于由 方程式：其中X表示Na浓度（ppb），Y表示照射持续时间（小时），Z表示照射表面上的紫外线照射的照度（mW / cm 2）。