HAT PATCH
    1.
    发明申请

    公开(公告)号:US20220095729A1

    公开(公告)日:2022-03-31

    申请号:US17490579

    申请日:2021-09-30

    Inventor: Yuri Parreno

    Abstract: A patch for a hat includes a body with a multi-layer composition including a layer of woven material, an adhesive layer, and a removable backing. The patch includes a first notch and a second notch in the layers of material. The notches are aligned with each other and located centrally with respect to the patch to assist in aligning the patch with the crown of a hat.

    HAT WITH REPLACABLE PARACORD CHINSTRAP
    2.
    发明申请

    公开(公告)号:US20200253317A1

    公开(公告)日:2020-08-13

    申请号:US16271070

    申请日:2019-02-08

    Abstract: A hat with a replaceable paracord chinstrap. A hat is provided that includes a removably attached paracord chinstrap. A chinstrap adjustment piece is attached to the hat and may be used to adjust the tightness around a wearer's chin. An instruction sheet is provided that includes instructions on how to attach the paracord chinstrap and adjustment piece and how to utilize the paracord chinstrap.

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