Forming Ion Pump Having Silicon Manifold
    1.
    发明申请

    公开(公告)号:US20180233338A1

    公开(公告)日:2018-08-16

    申请号:US15948465

    申请日:2018-04-09

    CPC classification number: H01J41/14 F04B37/14 H01J41/18

    Abstract: An ultra-high vacuum (UHV) system includes a UHV cell and an ion pump to maintain the UHV in the UHV cell. The ion pump has a GCC (glass, ceramic, or crystalline) housing. An interior wall of the ion-pump housing serves as an anode or bears a coating that serves as an anode. At least one cathode is disposed with respect to the housing so that it can cooperate with the anode to form an electric field for establishing a Penning trap. The GCC housing defines a flow channel that extends radially through the anode so that a molecule can flow directly into the most ionizing region of a Penning trap.

    Charged particle beam apparatus
    9.
    发明授权
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号:US07582885B2

    公开(公告)日:2009-09-01

    申请号:US11401878

    申请日:2006-04-12

    Abstract: A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.

    Abstract translation: 提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。 将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游,并且将最少数量的离子泵放置在下游,使得两个泵组合使用。 此外,通过将可拆卸线圈安装在电子枪部件上,可以将真空度保持在10-8Pa以下的真空度的高真空下。

    Exhaust apparatus and vacuum pumping unit including the exhaust apparatus
    10.
    发明授权
    Exhaust apparatus and vacuum pumping unit including the exhaust apparatus 失效
    排气装置和真空泵单元包括排气装置

    公开(公告)号:US5240381A

    公开(公告)日:1993-08-31

    申请号:US833853

    申请日:1992-02-12

    CPC classification number: H01J41/18 H01J41/14

    Abstract: An exhaust apparatus and a high vacuum pumping unit including such high vacuum device and an auxiliary vacuum pump are disclosed, wherein a high vacuum is achieved in a vacuum vessel such that the gas molecules within the vacuum vessel are ionized and accelerated to be exhausted and, further, in the high vacuum pumping unit, those gas molecules diffused back or desorbed from the vacuum pump are ionized and accelerated to be returned to the vacuum pump.

    Abstract translation: 公开了一种包括这种高真空装置和辅助真空泵的排气装置和高真空泵送装置,其中在真空容器中实现高真空,使得真空容器内的气体分子被离子化并加速而被排出, 此外,在高真空泵送单元中,从真空泵向后扩散或解吸的那些气体分子被离子化并加速以返回到真空泵。

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