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    Aqueous Electrolyte Composition Having a Reduced Airborne Emission, Method and Use of this Composition
    4.
    发明申请
    Aqueous Electrolyte Composition Having a Reduced Airborne Emission, Method and Use of this Composition 有权
    具有减少的空气排放的水性电解质组合物，该组合物的方法和用途

    公开(公告)号：US20160222534A1

    公开(公告)日：2016-08-04

    申请号：US14916706

    申请日：2014-08-05

    申请人： ENTHONE, INC.

    发明人： Helmut Horsthemke

    IPC分类号： C25D3/10 ,  C07C317/04 ,  C23C18/36

    CPC分类号： C25D3/10 ,  C07C317/04 ,  C23C18/1675 ,  C23C18/31 ,  C23C18/36 ,  C25D3/02 ,  C25D21/12

    摘要： An aqueous electrolyte for the deposition of a metal layer on a substrate surface as well as a method for the deposition of a metal layer on a substrate surface by which electrolyte and in which method the formation of airborne emissions above the surface of the electrolyte in a plating tank is significantly reduced or more preferably omitted. The aqueous electrolyte composition according to the invention comprises at least one surfactant in a concentration affecting a dynamic surface tension of the composition of ≦35 mN/m.

    摘要翻译： 一种用于在基材表面上沉积金属层的水性电解质以及用于在电解质的基板表面上沉积金属层的方法，并且在该方法中，在电解质的表面上形成空气中的排放物 电镀槽显着减少或更优选地省略。 根据本发明的电解质水溶液组合物包含至少一种表面活性剂，其浓度影响组合物的动态表面张力≤35mN/ m。

    CHROMIUM PLATING METHOD
    5.
    发明申请
    CHROMIUM PLATING METHOD 审中-公开
    铬镀层法

    公开(公告)号：US20120279869A1

    公开(公告)日：2012-11-08

    申请号：US13520594

    申请日：2010-12-24

    申请人： Toru Murakami ,  Ryo Maeda ,  Hamid Suhaimi ,  Aidilla Nurul ,  Murushid Mohd

    发明人： Toru Murakami ,  Ryo Maeda ,  Hamid Suhaimi ,  Aidilla Nurul ,  Murushid Mohd

    IPC分类号： C25D3/06

    CPC分类号： C25D3/04 ,  C25D3/06 ,  C25D3/08 ,  C25D3/10 ,  C25D17/10

    摘要： A chromium plating method wherein an article to be plated is immersed in an acidic chromium electroplating bath and electrolysis is carried out using a positive electrode that has an iridium oxide-containing film at least on the surface. The acidic chromium electroplating bath contains a trivalent chromium compound and a hexavalent chromium compound at a ratio such that the total chromium concentration of trivalent chromium and hexavalent chromium is 60-140 g/L, the hexavalent chromium concentration is 5-40 g/L, and the ratio of the hexavalent chromium concentration is 5-35% by mass of the total chromium concentration, while containing 50-400 g/L of organic carboxylate ions and having a lead ion concentration of not more than 2 mg/L. By the method, a chromium plating film that is good and stable over a long time period can be obtained. In addition, the plating bath can be controlled extremely easily in the chromium plating method.

    摘要翻译： 一种镀铬方法，其中将待镀制品浸入酸性铬电镀浴中，并且使用至少在表面上具有含氧化铱的膜的正极进行电解。 酸性铬电镀浴含有三价铬化合物和六价铬化合物，其比例使得三价铬和六价铬的总铬浓度为60-140g / L，六价铬浓度为5-40g / L， 并且六价铬浓度的比例为总铬浓度的5-35质量％，同时含有50-400g / L的有机羧酸根离子，并且铅离子浓度不大于2mg / L。 通过该方法，可以获得长时间良好且稳定的镀铬膜。 此外，镀铬法可以极其容易地控制电镀液。

    Methods and electrolyte compositions for electrodepositing metal-carbon alloys
    7.
    发明授权
    Methods and electrolyte compositions for electrodepositing metal-carbon alloys 失效
    电沉积金属 - 碳合金的方法和电解质组成

    公开(公告)号：US5672262A

    公开(公告)日：1997-09-30

    申请号：US411191

    申请日：1995-03-27

    申请人： Christian E. Johnson ,  David Lashmore ,  Elaine Soltani

    发明人： Christian E. Johnson ,  David Lashmore ,  Elaine Soltani

    IPC分类号： C25D3/06 ,  C25D3/10 ,  C25D3/00

    CPC分类号： C25D3/10 ,  C25D3/06

    摘要： Methods for electrodepositing a metal-carbon coating on a substrate comprng immersing the substrate in an aqueous electrolyte, and passing a sufficient current through the electrolyte to effect electrolyte deposition of a metal-carbon alloy on the substrate. The aqueous electrolyte comprises from about 0.2 to about 0.6 mol/l of metal ions selected from the group consisting of iron, nickel, nickel-tungsten mixture and cobalt-tungsten mixture, greater than about 1.4 mol/l of an amidosulfonic acid or a salt thereof, ammonium ions, formic acid or a salt thereof, and water.

    摘要翻译： 将金属 - 碳涂层电沉积在基材上的方法，包括将基材浸入含水电解质中，并使足够的电流通过电解质，以使金属 - 碳合金在基材上沉积。 含水电解质包含约0.2至约0.6mol / l的选自铁，镍，镍 - 钨混合物和钴 - 钨混合物的金属离子，大于约1.4mol / l的酰胺磺酸或盐 铵离子，甲酸或其盐和水。

    High-performance electrodeposited chromium layers formed at high current efficiencies
    8.
    发明授权
    High-performance electrodeposited chromium layers formed at high current efficiencies 失效
    以高电流效率形成的高性能电沉积铬层

    公开(公告)号：US4927506A

    公开(公告)日：1990-05-22

    申请号：US407174

    申请日：1989-09-14

    申请人： Nicholas M. Martyak

    发明人： Nicholas M. Martyak

    IPC分类号： C25D3/04 ,  C25D3/10

    CPC分类号： C25D3/04 ,  C25D3/10

    摘要： Novel chromium plating baths suitable for electrodepositing chromium layers which are bright, adherent, smooth and hard, and are capable of being formed at both high and low current densities, and at high cathodic current efficiencies, consist essentially of chromic acid and sulfoacetic acid in a concentration range of about 40 to 150 g/l., and selenate or tellurate ion. Sulfate ion, if present, is included in low concentrations such that the Cr/SO.sub.4 ratio is high, preferably 300:1 or more.

    摘要翻译： 适用于电沉积铬层的新型镀铬浴，其明亮，粘附，光滑和硬，并且能够以高电流和低电流密度形成，并且在高阴极电流效率下，基本上由铬酸和磺基乙酸组成 浓度范围为约40至150g / l，硒酸盐或碲酸根离子。 硫酸根离子（如果存在）以低浓度包含，使得Cr / SO 4比高，优选为300:1或更高。

    Hard chromium plating from hexavalent plating bath
    9.
    发明授权
    Hard chromium plating from hexavalent plating bath 失效
    从六价电镀浴硬镀铬

    公开(公告)号：US4406756A

    公开(公告)日：1983-09-27

    申请号：US282522

    申请日：1981-07-13

    申请人： Anthony D. Baranyi

    发明人： Anthony D. Baranyi

    IPC分类号： C25D3/10

    CPC分类号： C25D3/10

    摘要： The efficiency of hard chromium plating from a standard aqueous acidic bath containing hexavalent chromium ions and sulfate ions is increased by the addition of lower alkyl amino acids, di(lower alkyl)formamides, di(lower alkyl)sulfoxides and bisulfate salts.

    摘要翻译： 通过添加低级烷基氨基酸，二（低级烷基）甲酰胺，二（低级烷基）亚砜和硫酸氢盐，从含有六价铬离子和硫酸根离子的标准含水酸性浴中进行硬铬镀层的效率提高。