Method for defect isolation of thin-film solar cell
    1.
    发明授权
    Method for defect isolation of thin-film solar cell 有权
    薄膜太阳能电池的缺陷隔离方法

    公开(公告)号:US08497150B2

    公开(公告)日:2013-07-30

    申请号:US12569024

    申请日:2009-09-29

    IPC分类号: H01L21/00

    摘要: This invention discloses a defect isolation method for thin-film solar cell having at least a defect therein. The thin-film solar cell comprises a substrate, a front electrode layer, an absorber layer and a back electrode layer stacked in such a sequence. The defect isolation method includes the steps of: detecting at least a defect formed in thin-film solar cell and acquiring the positions of the defects, and applying a laser light to scribe the outer circumference of the defects according to the positions of the defects so as to form at least an isolation groove having a closed-curve configuration.

    摘要翻译: 本发明公开了一种至少具有缺陷的薄膜太阳能电池的缺陷隔离方法。 薄膜太阳能电池包括以这样的顺序层叠的基板,前电极层,吸收体层和背面电极层。 缺陷隔离方法包括以下步骤:至少检测薄膜太阳能电池中形成的缺陷并获取缺陷的位置,并根据缺陷的位置施加激光来刻划缺陷的外周。 至少形成具有闭合曲线构造的隔离槽。

    METHOD FOR DEFECT ISOLATION OF THIN-FILM SOLAR CELL
    2.
    发明申请
    METHOD FOR DEFECT ISOLATION OF THIN-FILM SOLAR CELL 有权
    薄膜太阳能电池缺陷分离方法

    公开(公告)号:US20100087025A1

    公开(公告)日:2010-04-08

    申请号:US12569024

    申请日:2009-09-29

    IPC分类号: H01L31/18

    摘要: This invention discloses a defect isolation method for thin-film solar cell having at least a defect therein. The thin-film solar cell comprises a substrate, a front electrode layer, an absorber layer and a back electrode layer stacked in such a sequence. The defect isolation method includes the steps of: detecting at least a defect formed in thin-film solar cell and acquiring the positions of the defects, and applying a laser light to scribe the outer circumference of the defects according to the positions of the defects so as to form at least an isolation groove having a closed-curve configuration.

    摘要翻译: 本发明公开了一种至少具有缺陷的薄膜太阳能电池的缺陷隔离方法。 薄膜太阳能电池包括以这样的顺序层叠的基板,前电极层,吸收体层和背面电极层。 缺陷隔离方法包括以下步骤:至少检测薄膜太阳能电池中形成的缺陷并获取缺陷的位置,并根据缺陷的位置施加激光来刻划缺陷的外周。 至少形成具有闭合曲线构造的隔离槽。