Sample measurement method and measurement sample base material
    1.
    发明申请
    Sample measurement method and measurement sample base material 失效
    样品测量方法和测量样品基材

    公开(公告)号:US20050082478A1

    公开(公告)日:2005-04-21

    申请号:US10926951

    申请日:2004-08-27

    CPC分类号: G01N23/225

    摘要: A sample measurement method is a sample measurement method by an electron microscope and includes the film formation step of forming a sample on a projection on the major surface of a substrate, the electron beam irradiation step of irradiating the sample with an electron beam from a side of the projection, and the measurement step of detecting an electron beam which is generated or reflected from or has passed through the sample irradiated with the electron beam. Since the sample is formed on the projection on the major surface of the substrate, the sample on the projection can be formed as a thin film. For this reason, sample measurement can be executed only by irradiating the sample from a side of the projection.

    摘要翻译: 样品测量方法是通过电子显微镜的样品测量方法,包括在基板的主表面上的突起上形成样品的成膜步骤,电子束照射步骤,用来自侧面的电子束照射样品 以及检测由电子束照射的样品产生或反射或已通过样品的电子束的测量步骤。 由于样品形成在基板的主表面上的突起上,所以突起上的样品可以形成为薄膜。 因此,可以仅通过从投影侧照射样品来进行样品测定。

    Sample measurement method and measurement sample base material
    2.
    发明授权
    Sample measurement method and measurement sample base material 失效
    样品测量方法和测量样品基材

    公开(公告)号:US07189968B2

    公开(公告)日:2007-03-13

    申请号:US10926951

    申请日:2004-08-27

    IPC分类号: G01N1/28 H01J37/20

    CPC分类号: G01N23/225

    摘要: A sample measurement method is a sample measurement method by an electron microscope and includes the film formation step of forming a sample on a projection on the major surface of a substrate, the electron beam irradiation step of irradiating the sample with an electron beam from a side of the projection, and the measurement step of detecting an electron beam which is generated or reflected from or has passed through the sample irradiated with the electron beam. Since the sample is formed on the projection on the major surface of the substrate, the sample on the projection can be formed as a thin film. For this reason, sample measurement can be executed only by irradiating the sample from a side of the projection.

    摘要翻译: 样品测量方法是通过电子显微镜的样品测量方法,包括在基板的主表面上的突起上形成样品的成膜步骤,电子束照射步骤,用来自侧面的电子束照射样品 以及检测由电子束照射的样品产生或反射或已通过样品的电子束的测量步骤。 由于样品形成在基板的主表面上的突起上,所以突起上的样品可以形成为薄膜。 因此,可以仅通过从投影侧照射样品来进行样品测定。

    Sputtering target for forming thin phosphor film
    3.
    发明申请
    Sputtering target for forming thin phosphor film 审中-公开
    用于形成薄荧光膜的溅射靶

    公开(公告)号:US20060254462A1

    公开(公告)日:2006-11-16

    申请号:US10548476

    申请日:2004-03-05

    IPC分类号: C09C1/10

    摘要: A sputtering target for fluorescent thin-film formation comprising a matrix material and a luminescent center material, wherein said matrix material has a chemical composition represented by the following formula (1), and simultaneously satisfies conditions represented by the following inequalities (2) to (5). MIIvAxByOzSw   (1) 0.05≦v/x≦5   (2) 1≦y/x≦6   (3) 0.01≦z/(z+w)≦0.85   (4) 0.6≦(v+x+3y/2)/(z+w)≦1.5   (5) wherein MII represents one or more elements selected from the group consisting of Zn, Cd and Hg, A represents one or more elements selected from the group consisting of Mg, Ca, Sr, Ba and rare earth elements, B represents one or more elements selected from the group consisting of Al, Ga and In, and v, x, y, z and w each represent numerical values satisfying the conditions specified in the inequalities (2) to (5).

    摘要翻译: 1.一种荧光薄膜形成用溅射靶,其特征在于,具有基体材料和发光中心材料,其中,所述基体材料具有下述式(1)所示的化学成分,同时满足下述不等式(2)〜( 5)。 <?in-line-formula description =“In-line Formulas”end =“lead”?> M (1)<?in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line Formulas”end =“lead”?> 0.05 <= v / x <= 5(2)<?in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line Formulas”end =“lead”?> 1 <= y / x <= 6(3)<?in-line-formula description = 在线公式“end =”tail“?> <?in-line-formula description =”In-line Formulas“end =”lead“?> 0.01 <= z /(z + w)<= 0.85(4) <?in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line formula”end =“lead”?> 0.6 <=(v + x + 3y / 2)/(z + w)<= 1.5(5)<?in-line-formula description =“In-line Formulas”end =“tail”?>其中M II 表示选自Zn,Cd和Hg中的一种或多种元素,A表示选自Mg,Ca,Sr,Ba和稀有元素中的一种或多种元素 B元素选自Al,Ga和In中的一种或多种元素,v,x,y,z和w分别表示满足不等式(2)〜(5)中规定的条件的数值。

    Sputtering target for forming thin phosphor film
    4.
    发明授权
    Sputtering target for forming thin phosphor film 有权
    用于形成薄荧光膜的溅射靶

    公开(公告)号:US07540976B2

    公开(公告)日:2009-06-02

    申请号:US10548476

    申请日:2004-03-05

    摘要: A sputtering target for fluorescent thin-film formation comprising a matrix material and a luminescent center material,wherein said matrix material has a chemical composition represented by the following formula (1), and simultaneously satisfies conditions represented by the following inequalities (2) to (5). MIIvAxByOzSw   (1) 0.05≦v/x≦5   (2) 1≦y/x≦6   (3) 0.01≦z/(z+w)≦0.85   (4) 0.6≦(v+x+3y/2)/(z+w)≦1.5   (5) wherein MII represents one or more elements selected from the group consisting of Zn, Cd and Hg, A represents one or more elements selected from the group consisting of Mg, Ca, Sr, Ba and rare earth elements, B represents one or more elements selected from the group consisting of Al, Ga and In, and v, x, y, z and w each represent numerical values satisfying the conditions specified in the inequalities (2) to (5).

    摘要翻译: 1.一种荧光薄膜形成用溅射靶,其特征在于,具有基体材料和发光中心材料,其中,所述基体材料具有下述式(1)所示的化学成分,同时满足下述不等式(2)〜( 5)。 <?in-line-formula description =“In-line Formulas”end =“lead”?> MIIvAxByOzSw(1)<?in-line-formula description =“In-line formula”end =“tail”?> in-line-formula description =“In-line Formulas”end =“lead”?> 0.05 <= v / x <= 5(2)<?in-line-formula description =“In-line Formulas”end = 尾部“?> <?in-line-formula description =”In-line Formulas“end =”lead“?> 1 <= y / x <= 6(3)<?in-line-formula description = 行公式“end =”tail“?> <?in-line-formula description =”In-line Formulas“end =”lead“?> 0.01 <= z /(z + w)<= 0.85(4) in-line-formula description =“In-line Formulas”end =“tail”?> <?in-line-formula description =“In-line Formulas”end =“lead”?> 0.6 <=(v + x + 3y / 2)/(z + w)<= 1.5(5)<?in-line-formula description =“In-line Formulas”end =“tail”?>其中MII表示选自以下的一个或多个元素: 的Zn,Cd和Hg,A表示选自Mg,Ca,Sr,Ba和稀土元素中的一种或多种元素,B表示选自以下的一种或多种元素: 的Al,Ga和In,v,x,y,z和w分别表示满足不等式(2)〜(5)中规定的条件的数值。

    EL functional film and EL element
    5.
    发明授权
    EL functional film and EL element 有权
    EL功能膜和EL元件

    公开(公告)号:US08466615B2

    公开(公告)日:2013-06-18

    申请号:US10547399

    申请日:2004-02-27

    IPC分类号: H05B33/14 H01J1/62

    CPC分类号: C09K11/621 C09K11/7729

    摘要: An EL element 1 comprises EL functional layers 6, 10 comprising Ga2O3:Eu between a thick film insulator layer 16 and an upper electrode 12 provided on a substrate 2 on which a lower electrode 4 was formed and a light-emitting layer 8 comprising MgGa2O4 formed therebetween. The EL functional layers 6, 10 have the dual functions of insulating layers and electron doping layers. Due to this, the EL element 1 has a low drive voltage and high light-emitting brightness, and the structure of the EL element is simplified.

    摘要翻译: EL元件1包括在厚膜绝缘体层16和设置在其上形成有下电极4的基板2上的上电极12之间包括Ga 2 O 3:Eu的EL功能层6,10,以及形成有包含MgGa 2 O 4的发光层8 之间。 EL功能层6,10具有绝缘层和电子掺杂层的双重功能。 由此,EL元件1具有低的驱动电压和高的发光亮度,并且EL元件的结构被简化。

    Phosphor thin film, manufacturing method of the same, and electroluminescence panel
    7.
    发明授权
    Phosphor thin film, manufacturing method of the same, and electroluminescence panel 失效
    荧光体薄膜,其制造方法和电致发光面板

    公开(公告)号:US06984460B2

    公开(公告)日:2006-01-10

    申请号:US10394212

    申请日:2003-03-24

    IPC分类号: H05B33/12 B32B9/04

    摘要: The present invention aims at providing a phosphor thin film capable of realizing a light-emitting device attaining an excellent response, favorable color purity, and emission with a high luminance; and an EL panel including the same. The EL panel including the phosphor thin film of the present invention comprises a substrate, and a lower electrode, an insulating layer, an EL phosphor laminate thin film, and an upper electrode which are successively laminated on the substrate. In the EL phosphor laminate thin film, buffer thin films are formed on both sides of a phosphor thin film comprising a matrix material which is essentially constituted by magnesium gallate and doped with a rare-earth element or the like, and electron injection thin films are further formed on both sides thereof.

    摘要翻译: 本发明的目的在于提供能够实现发光装置的优异响应,良好的色纯度和高亮度的发光的荧光体薄膜; 和包括该EL面板的EL面板。 包括本发明的荧光体薄膜的EL面板包括依次层压在基板上的基板,下电极,绝缘层,EL荧光体层压薄膜和上电极。 在EL荧光体层叠薄膜中,缓冲薄膜形成在荧光体薄膜的两面,该荧光体薄膜包括基本材料,基体材料基本上由没食子酸镁构成并掺杂有稀土元素等,电子注入薄膜是 进一步形成在其两侧。

    EL FUNCTIONAL FILM EL ELEMENT
    8.
    发明申请
    EL FUNCTIONAL FILM EL ELEMENT 有权
    EL功能膜元件

    公开(公告)号:US20070013300A1

    公开(公告)日:2007-01-18

    申请号:US10547399

    申请日:2004-02-27

    IPC分类号: H05B33/14 H01J1/62

    CPC分类号: C09K11/621 C09K11/7729

    摘要: An EL element 1 comprises EL functional layers 6, 10 comprising Ga2O3:Eu between a thick film insulator layer 16 and an upper electrode 12 provided on a substrate 2 on which a lower electrode 4 was formed and a light-emitting layer 8 comprising MgGa2O4 formed therebetween. The EL functional layers 6, 10 have the dual functions of insulating layers and electron doping layers. Due to this, the EL element 1 has a low drive voltage and high light-emitting brightness, and the structure of the EL element is simplified.

    摘要翻译: EL元件1包括在厚膜绝缘体层16和设置在基板2上的上电极12之间的包括Ga 2 O 3/3 Eu的EL功能层6,10 其中形成有下电极4和在其间形成的包含MgGa 2 O 4 O 4的发光层8。 EL功能层6,10具有绝缘层和电子掺杂层的双重功能。 由此,EL元件1具有低的驱动电压和高的发光亮度,并且EL元件的结构被简化。

    Electroluminescence phosphor multilayer thin film and electroluminescence element
    9.
    发明授权
    Electroluminescence phosphor multilayer thin film and electroluminescence element 有权
    电致发光荧光粉多层薄膜和电致发光元件

    公开(公告)号:US06876146B2

    公开(公告)日:2005-04-05

    申请号:US10394150

    申请日:2003-03-24

    摘要: The present invention aims at realizing a phosphor thin film having a high luminance with a low emission threshold voltage, and an EL element comprising the same. The EL element of the present invention comprises a substrate, and a lower electrode, a lower buffer thin film containing a sulfide such as ZnS, a phosphor thin film containing an oxide such as a gallate as a matrix material, an upper buffer thin film containing a sulfide such as ZnS, and an upper electrode which are successively laminated on the substrate.

    摘要翻译: 本发明的目的在于实现具有低发光阈值电压的高亮度的荧光体薄膜和包括该荧光体薄膜的EL元件。 本发明的EL元件包括基板和下电极,含有诸如ZnS的硫化物的下缓冲薄膜,含有诸如没食子酸酯的氧化物的荧光体薄膜作为基体材料,上缓冲薄膜含有 诸如ZnS的硫化物和上电极,其依次层压在基板上。

    Method for producing light-emitting film and light-emitting device
    10.
    发明授权
    Method for producing light-emitting film and light-emitting device 失效
    发光膜和发光装置的制造方法

    公开(公告)号:US08574955B2

    公开(公告)日:2013-11-05

    申请号:US13297027

    申请日:2011-11-15

    IPC分类号: H01L21/00 H01L29/24

    摘要: Provided is a light-emitting film having controllable resistivity, and a high-luminance light-emitting device, which can be driven at a low voltage, using such light-emitting film. The light-emitting film includes Cu as an addition element in a zinc sulfide compound which is a base material, wherein the zinc sulfide compound includes columnar ZnS crystals, and sites formed of copper sulfide on a grain boundary where the ZnS crystals are in contact with each other.

    摘要翻译: 提供一种具有可控电阻率的发光膜和可以使用这种发光膜在低电压下驱动的高亮度发光装置。 发光膜包含Cu作为添加元素,作为基材的硫化锌化合物,其中硫化锌化合物包括柱状ZnS晶体,ZnS晶体与ZnS晶体接触的晶界上由硫化铜形成的部位 彼此。