发明授权
- 专利标题: Sample measurement method and measurement sample base material
- 专利标题(中): 样品测量方法和测量样品基材
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申请号: US10926951申请日: 2004-08-27
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公开(公告)号: US07189968B2公开(公告)日: 2007-03-13
- 发明人: Yoshitomo Tanaka , Masaki Takahashi , Tomoyuki Oike
- 申请人: Yoshitomo Tanaka , Masaki Takahashi , Tomoyuki Oike
- 申请人地址: JP Tokyo
- 专利权人: TDK Corporation
- 当前专利权人: TDK Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JPP2003-308058 20030829
- 主分类号: G01N1/28
- IPC分类号: G01N1/28 ; H01J37/20
摘要:
A sample measurement method is a sample measurement method by an electron microscope and includes the film formation step of forming a sample on a projection on the major surface of a substrate, the electron beam irradiation step of irradiating the sample with an electron beam from a side of the projection, and the measurement step of detecting an electron beam which is generated or reflected from or has passed through the sample irradiated with the electron beam. Since the sample is formed on the projection on the major surface of the substrate, the sample on the projection can be formed as a thin film. For this reason, sample measurement can be executed only by irradiating the sample from a side of the projection.
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