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    Coating material for forming titanium oxide film, method for forming titanium oxide film and use of said coating material
    2.
    发明授权
    Coating material for forming titanium oxide film, method for forming titanium oxide film and use of said coating material 失效
    用于形成氧化钛膜的涂料，用于形成氧化钛膜的方法和所述涂料的用途

    公开(公告)号：US06736890B2

    公开(公告)日：2004-05-18

    申请号：US10312571

    申请日：2003-01-14

    申请人： Yasuhiko Haruta ,  Jun Akui ,  Osamu Isozaki

    发明人： Yasuhiko Haruta ,  Jun Akui ,  Osamu Isozaki

    IPC分类号： C01G23053

    CPC分类号： C23C22/34 ,  C09D1/00 ,  C23C18/1216 ,  C23C18/1241 ,  C23C22/83 ,  C23C30/00

    摘要： The present invention provides: a coating composition for forming a titanium oxide film, comprising (A) a titanium-containing aqueous liquid obtained by mixing at least one titanium compound selected from the group consisting of hydrolyzable titanium compounds, low condensates of hydrolyzable titanium compounds, titanium hydroxide and low condensates of titanium hydroxide with aqueous hydrogen peroxide, and (B) at least one halide selected from the group consisting of titanium halides, titanium halide salts, zirconium halides, zirconium halide salts, silicon halides and silicon halide salts; a process for forming a titanium oxide film, comprising applying the coating composition to a metal substrate and drying the resulting coat; and an undercoating material for metal substrates and a post-treating agent for phosphate undercoats on metal substrates, the material and agent being the above coating composition.

    摘要翻译： 本发明提供：一种用于形成氧化钛膜的涂料组合物，其包含（A）通过混合至少一种钛化合物而获得的含钛水性液体，所述钛化合物选自可水解的钛化合物，可水解的钛化合物的低缩合物， 氢氧化钛和氢氧化钛与过氧化氢水溶液的低冷凝物，和（B）至少一种选自卤化钛，卤化钛盐，卤化锆，卤化锆盐，卤化硅和卤化硅盐的卤化物; 一种形成氧化钛膜的方法，包括将所述涂料组合物涂覆在金属基材上并干燥所得涂层; 以及用于金属基材的底漆材料和金属基材上的磷酸盐底漆的后处理剂，作为上述涂料组合物的材料和试剂。

    Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same
    5.
    发明授权
    Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same 失效
    液体光固化性组合物，水性光固化性组合物及其抗蚀剂图案形成方法

    公开(公告)号：US06420090B1

    公开(公告)日：2002-07-16

    申请号：US09453504

    申请日：1999-12-03

    申请人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

    发明人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

    IPC分类号： G03F7037

    CPC分类号： G03F7/164 ,  G03F7/027

    摘要： A liquid photocurable composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other, and optionally containing a photopolymerizable compound other than the photopolymerizable polyurethane compound.

    摘要翻译： 含有具有由下式表示的重复单元的光聚合性聚氨酯化合物的液体光固化性组合物：B- [X] n [Y] mB，其中X由下式表示：Y由下式表示：-OOCHN-A -NHCOO（R2） - ，A是衍生自多异氰酸酯化合物的结构单元，B相同或不同，并且衍生自在分子末端具有至少一个光聚合性不饱和基团且任选地含有醚键的羟基化合物的结构单元， R1是衍生自含羧基的多元醇化合物的结构单元，R2是来自多元醇化合物的结构单元，n是1〜10的整数，m是1〜10的整数，条件是一个X和一个 Y彼此键合，或者X和/或Y中的三个或更多个彼此键合，并且任选地含有除光聚合性聚氨酯化合物以外的光聚合性化合物。

    Organic-solvent-based photocurable resist composition and resist pattern-forming method
    7.
    发明授权
    Organic-solvent-based photocurable resist composition and resist pattern-forming method 失效
    有机溶剂型光固化抗蚀剂组合物和抗蚀剂图案形成方法

    公开(公告)号：US06331376B1

    公开(公告)日：2001-12-18

    申请号：US09582846

    申请日：2000-07-05

    申请人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

    发明人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

    IPC分类号： G03F7029

    CPC分类号： G03F7/027 ,  C08F290/067 ,  C08G18/672 ,  C08G18/7642 ,  G03F7/0388 ,  C08G18/48 ,  C08G18/0823

    摘要： An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.

    摘要翻译： 含有具有下式表示的重复单元的光聚合性聚氨酯化合物的有机溶剂型光固化抗蚀剂组合物：B- [X] n [Y] mB，其中X由下式表示：Y由下式表示： - OOCHN-A-NHCOO（R2） - ，A是衍生自多异氰酸酯化合物的结构单元，B相同或不同，并且衍生自在分子末端具有至少一个光聚合性不饱和基团的羟基化合物的结构单元，并且任选地含有 醚键，R1是衍生自含羧基的多元醇化合物的结构单元，R2是衍生自多元醇化合物的结构单元，n是1〜10的整数，m是1〜10的整数，条件是一个 X和一个Y彼此键合，或者X和/或Y中的三个或更多个彼此键合。

    Photosensitive resin composition
    8.
    发明授权
    Photosensitive resin composition 失效
    感光树脂组合物

    公开(公告)号：US06344307B1

    公开(公告)日：2002-02-05

    申请号：US09673316

    申请日：2000-10-13

    申请人： Daisuke Kojima ,  Osamu Isozaki ,  Hideo Kogure ,  Genji Imai

    发明人： Daisuke Kojima ,  Osamu Isozaki ,  Hideo Kogure ,  Genji Imai

    IPC分类号： G03F7027

    CPC分类号： G03F7/0392 ,  C08F2/48 ,  G03F7/0045

    摘要： A photosensitive resin composition characterized by comprising (A) a resin having at least one aprotic onium salt represented by the general formula: —COO−·W+  (1) and/or the general formula: (in each of the above general formulas, W+ represents wherein, Z represents a nitrogen atom or phosphorus atom; Y represents a sulfur atom; R1, R2, R3 and R4 each represents an organic group having 1 to 30 carbon atoms), (B) a compound having two or more vinylether groups in a molecule and (C) a compound which generates an acid upon irradiation with actinic energy rays.

    摘要翻译： 一种感光性树脂组合物，其特征在于，包含（A）具有至少一种由以下通式表示的非质子性盐的树脂：和/或通式：（在上述通式的每一个中，W +表示，其中Z表示氮原子或 磷原子; Y表示硫原子; R1，R2，R3和R4各自表示碳原子数1〜30的有机基），（B）分子中具有2个以上的乙烯基醚基的化合物，（C） 在光化能量射线照射时产生酸。

    Resins with unsaturated carbonyl and hydroxyl groups
    9.
    发明授权
    Resins with unsaturated carbonyl and hydroxyl groups 失效
    具有不饱和羰基和羟基的树脂

    公开(公告)号：US5216094A

    公开(公告)日：1993-06-01

    申请号：US884881

    申请日：1992-05-18

    申请人： Osamu Isozaki ,  Naozumi Iwasawa

    发明人： Osamu Isozaki ,  Naozumi Iwasawa

    IPC分类号： C08F8/44

    CPC分类号： C08F8/44

    摘要： The present invention provides a curable resin coating composition consisting essentially of:(i) a resin (A) containing .alpha.,.beta.-unsaturated carbonyl group and primary and/or secondary hydroxyl group, or(ii) a mixture of a resin (B) containing .alpha.,.beta.-unsaturated carbonyl group and a resin (C) containing primary and/or secondary hydroxyl group, and(iii) at least one curing catalyst selected from the group consisting of alkali metal alkoxides, metal hydroxides, organic acid salts of metals, quaternary ammonium hydroxides, quaternary phosphonium hydroxides, tertiary sulfonium hydroxides and organic acid salts of these onium hydroxides.

    摘要翻译： 本发明提供一种可固化树脂涂料组合物，其基本上由以下组成：（i）含有α，β-不饱和羰基和伯和/或仲羟基的树脂（A），或（ii）树脂（B） 含有α，β-不饱和羰基和含有伯和/或仲羟基的树脂（C），和（iii）至少一种选自碱金属醇盐，金属氢氧化物，金属有机酸盐的固化催化剂 ，季铵氢氧化物，季铵氢氧化物，叔锍氢氧化物和这些氢氧化镧的有机酸盐。

    Coating compositions and methods for preventing adhesion of organisms
    10.
    发明授权
    Coating compositions and methods for preventing adhesion of organisms 失效
    用于防止生物粘附的涂料组合物和方法

    公开(公告)号：US5015472A

    公开(公告)日：1991-05-14

    申请号：US527465

    申请日：1990-05-23

    申请人： Osamu Isozaki ,  Naozumi Iwasawa ,  Toshiro Hirama ,  Hiroshi Iwai

    发明人： Osamu Isozaki ,  Naozumi Iwasawa ,  Toshiro Hirama ,  Hiroshi Iwai

    IPC分类号： C09D5/16

    CPC分类号： C09D5/1668

    摘要： Disclosed are a coating composition (A) for preventing adhesion of organisms which comprises as its vehicle component a homopolymer or a copolymer, the homopolymer being one prepared by homopolymerizing a phenol-modified unsaturated monomer obtained by reacting (a) an unsaturated monomer containing epoxy group and/or hydroxyl group with (b) an addition reaction product of a phenolic compound with a compound having one carboxylic anhydride group per molecule, and the copolymer being one prepared by copolymerizing said phenol-modified unsaturated monomer and a radically polymerizable unsaturated monomer, and also a coating composition (B) for preventing adhesion of organisms which comprises as its vehicle component a phenol-modified resin prepared by reacting (c) a resin containing epoxy group and/or hydroxyl group with (b) and addition reaction product of a phenolic compound with a compound having one carboxylic anhyhdride group per molecule.Also disclosed is a method for preventing adhesion of organisms, characterized by coating a substrate with the coating composition (A) or (B).