公开(公告)号：US20130277205A1

公开(公告)日：2013-10-24

申请号：US13977314

申请日：2011-09-30

Applicant: Yangchao Li ,  Bo Geng ,  Xuewei Wu ,  Guoqing Qiu ,  Xu Liu

Inventor： Yangchao Li ,  Bo Geng ,  Xuewei Wu ,  Guoqing Qiu ,  Xu Liu

IPC: C23C14/35

CPC classification number: C23C14/35 ,  H01J37/3408 ,  H01J37/3455 ,  H01J37/347

Abstract: Provided is a magnetron source, which comprises a target material, a magnetron located thereabove and a scanning mechanism connected to the magnetron for controlling the movement of the magnetron above the target material. The scanning mechanism comprises a peach-shaped track, with the magnetron movably disposed thereon; a first driving shaft, with the bottom end thereof connected with the origin of the polar coordinates of the peach-shaped track, for driving the peach-shaped track to rotate about the axis of the first driving shaft; a first driver connected to the first driving shaft for driving the first driving shaft to rotate; and a second driver for driving the magnetron to move along the peach-shaped track via a transmission assembly. A magnetron sputtering device including the magnetron and a method for magnetron sputtering using the magnetron sputtering device are also provided.

Abstract translation: 提供了一种磁控管源，其包括目标材料，位于其上的磁控管和连接到磁控管的扫描机构，用于控制磁控管在目标材料上方的移动。 扫描机构包括桃形轨道，磁控管可移动地设置在其上; 第一驱动轴，其底端与桃形轨道的极坐标的原点连接，用于驱动桃形轨道围绕第一驱动轴的轴线旋转; 连接到第一驱动轴的第一驱动器，用于驱动第一驱动轴旋转; 以及第二驱动器，用于驱动磁控管经由传输组件沿着桃形轨迹移动。 还提供了包括磁控管的磁控溅射装置和使用磁控溅射装置的磁控溅射方法。

公开(公告)号：US09399817B2

公开(公告)日：2016-07-26

申请号：US13977314

申请日：2011-09-30

Applicant: Yangchao Li ,  Bo Geng ,  Xuewei Wu ,  Guoqing Qiu ,  Xu Liu

Inventor： Yangchao Li ,  Bo Geng ,  Xuewei Wu ,  Guoqing Qiu ,  Xu Liu

IPC: C23C14/35 ,  H01J37/34

CPC classification number: C23C14/35 ,  H01J37/3408 ,  H01J37/3455 ,  H01J37/347

Abstract: Provided is a magnetron source, which comprises a target material, a magnetron located thereabove and a scanning mechanism connected to the magnetron for controlling the movement of the magnetron above the target material. The scanning mechanism comprises a peach-shaped track, with the magnetron movably disposed thereon; a first driving shaft, with the bottom end thereof connected with the origin of the polar coordinates of the peach-shaped track, for driving the peach-shaped track to rotate about the axis of the first driving shaft; a first driver connected to the first driving shaft for driving the first driving shaft to rotate; and a second driver for driving the magnetron to move along the peach-shaped track via a transmission assembly. A magnetron sputtering device including the magnetron and a method for magnetron sputtering using the magnetron sputtering device are also provided.

Abstract translation: 提供了一种磁控管源，其包括目标材料，位于其上的磁控管和连接到磁控管的扫描机构，用于控制磁控管在目标材料上方的移动。 扫描机构包括桃形轨道，磁控管可移动地设置在其上; 第一驱动轴，其底端与桃形轨道的极坐标的原点连接，用于驱动桃形轨道围绕第一驱动轴的轴线旋转; 连接到第一驱动轴的第一驱动器，用于驱动第一驱动轴旋转; 以及第二驱动器，用于驱动磁控管经由传输组件沿着桃形轨迹移动。 还提供了包括磁控管的磁控溅射装置和使用磁控溅射装置的磁控溅射方法。