公开(公告)号：US20180308942A1

公开(公告)日：2018-10-25

申请号：US15529509

申请日：2017-04-11

Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.

Inventor： Xing Wang

IPC: H01L29/40 ,  H01L29/786 ,  H01L29/423 ,  H01L29/66

CPC classification number: H01L29/4908 ,  H01L21/28 ,  H01L21/77 ,  H01L27/1214 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/401 ,  H01L29/42384 ,  H01L29/6675 ,  H01L29/786 ,  H01L2021/775

Abstract: The present invention provides a manufacturing method of an electrode layer of a TFT substrate and a manufacturing method of a flexible TFT substrate. The manufacturing method of an electrode layer of a TFT substrate according to the present invention first forms a metallic nickel layer on a silicon backing, followed by applying CVD to deposit a graphene layer on the metallic nickel layer and applies plasma etching to etch the graphene layer to form a patterned graphene layer, and finally dissolves away the metallic nickel layer to separate the patterned graphene layer from the silicon backing to allow for transfer of the patterned graphene layer to obtain an electrode layer on a TFT substrate, wherein the electrode layer is formed of a graphene material that has excellent electrical conduction and mechanical properties and also has good thermal stability and chemical stability, so that the manufacturing method realizes production of an electrode layer that suits the need for bending of an electrode layer of a flexible display device.

公开(公告)号：US10725371B2

公开(公告)日：2020-07-28

申请号：US15745120

申请日：2017-10-12

Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.

Inventor： Kun Yang ,  Xing Wang

IPC: G03F7/20 ,  G03F1/38

Abstract: A method of manufacturing a substrate of a display device is provided. The method includes: providing a substrate body; coating a photoresist layer on the substrate body; exposing the photoresist layer by using a plurality lenses of an exposure machine through a mask, wherein the mask includes a light incident region and a light overlap region, the light overlap region includes a transparent zone and a non-transparent zone, and the light incident region includes a transparent zone and a non-transparent zone, and wherein an area of each transparent zone of the light overlap region is larger or smaller than an area of each transparent zone of the light incident region; and developing the photoresist layer after exposing to obtain a photoresist pattern. The embodiment of the disclosure also provides a mask applied to the method. By practice of the disclosure, the exposure pattern of the light overlap region could be compensated in order to obtain more accurate exposure pattern, so the product yield could be improved.