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公开(公告)号:US20190153595A1
公开(公告)日:2019-05-23
申请号:US15505107
申请日:2016-12-28
Inventor: Xuanyun Wang
IPC: C23C16/40 , C23C16/455 , H01L27/12 , H01L21/02
Abstract: The present invention provides a C-axis Aligned Crystalline IGZO thin film and a manufacture method thereof. In the manufacture method of the C-axis Aligned Crystalline IGZO thin film of the present invention, by utilizing the method of atomic layer deposition to manufacture the C-axis Aligned Crystalline IGZO thin film, the structure of the C-axis Aligned Crystalline IGZO can be accurately controlled in the atomic level, and the crystalline quality of the C-axis Aligned Crystalline IGZO is fine, and the oxygen defect is less, which can raise the stability of TFT; moreover, the area of the crystalline region in the C-axis Aligned Crystalline IGZO thin film is larger, which reaches up for micron level to millimeter level, and thus can promote the large scale application of the C-axis Aligned Crystalline IGZO; meanwhile, the present invention utilizes the optimized process condition to manufacture the C-axis Aligned Crystalline IGZO thin film.
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公开(公告)号:US10128453B2
公开(公告)日:2018-11-13
申请号:US15126584
申请日:2016-04-01
Inventor: Xuanyun Wang
IPC: H01L29/16 , H01L51/05 , H01L29/786 , H01B1/24 , H01L21/205 , H01L21/3065 , H01L27/32 , H01L29/66
Abstract: The present invention provides a method for manufacturing a graphene thin-film transistor, which includes: depositing a graphene layer on a surface of a copper foil; depositing a metal layer on a surface of the graphene layer; attaching a support layer to a surface of the metal layer to form a graphene film; placing the graphene film in a copper etching solution until the copper foil is dissolved completely, then transferring the graphene film to a target substrate, and removing the support layer; defining patterns of a source and a drain on the surface of the metal layer, manufacturing a source electrode and a drain electrode, and manufacturing a gate electrode on a target substrate.
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公开(公告)号:US10096656B1
公开(公告)日:2018-10-09
申请号:US15541471
申请日:2017-05-16
Inventor: Zhe Liu , Xuanyun Wang
Abstract: The invention provides a manufacturing method for complementary TFT device. The manufacturing method for complementary TFT device uses a solution method to continuously form a metal oxide semiconductor TFT and an organic semiconductor TFT; the metal oxide semiconductor TFT and the organic semiconductor TFT are electrically connected, and one of the metal oxide semiconductor TFT and the organic semiconductor TFT is an N-type channel TFT, and the other is a P-type channel TFT. The method can reduce the use of vacuum apparatus and high temperature apparatus, and explore the advantages of the solution method to realize large area and low-cost to reduce production costs and increase product competitiveness. The invention also provides a manufacturing method for OLED display panel, able to reduce production cost and increase product competitiveness.
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公开(公告)号:US20170253532A1
公开(公告)日:2017-09-07
申请号:US15085992
申请日:2016-03-30
Inventor: Xuanyun Wang
IPC: C04B35/622 , C09D5/24 , C01B31/04
CPC classification number: C04B35/62218 , C01B31/0438 , C04B35/522 , C09D5/24
Abstract: A method for manufacturing a flexible graphene electrically conductive film includes (1) providing a base and forming a graphene layer on a surface of the base; (2) providing polyvinyl alcohol, dissolving polyvinyl alcohol in water and heating to form a colloidal solution, which after cooling, forms a polyvinyl alcohol colloidal solution; and coating the polyvinyl alcohol colloidal solution on a surface of the graphene layer and drying so as to form a supporting layer on the surface of the graphene layer; (3) removing the base from the graphene layer; and (4) dissolving the supporting layer on the graphene layer in water so as to obtain a flexible graphene electrically conductive film that is free of surface residue.
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公开(公告)号:US10071935B2
公开(公告)日:2018-09-11
申请号:US15085992
申请日:2016-03-30
Inventor: Xuanyun Wang
IPC: H05B6/00 , C04B35/622 , C01B31/04 , C09D5/24
CPC classification number: C04B35/62218 , C01B32/182 , C04B35/522 , C09D5/24
Abstract: A photoelectric converter includes a photoelectric conversion element, which includes a first electrode and a second electrode disposed discretely and a photoelectric conversion material layer disposed between the first electrode and the second electrode and in which a current generated in the photoelectric conversion material layer changes with the lapse of an application time, where a constant amount of light is applied to the photoelectric conversion material layer while a voltage is applied between the first electrode and the second electrode, and a current detection circuit to detect the change in the current.
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