公开(公告)号：US20180104720A1

公开(公告)日：2018-04-19

申请号：US15566702

申请日：2016-04-01

Applicant: Wacker Chemie AG

Inventor： Michael FRICKE ,  Martin BRIXEL ,  Robert ENGGRUBER ,  Rainer HAUSWIRTH

IPC: B07B4/08 ,  B07B11/04 ,  B07B11/06

CPC classification number: B07B4/08 ,  B07B11/04 ,  B07B11/06 ,  B07B13/16 ,  C01B33/037

Abstract: Granular polysilicon is fed into a screening plant, divided into two or more fractions by means of one or more screen surfaces, and thereby classified and dedusted wherein a throwing motion of the granular polysilicon in the screening plant removes adhering dust particles from the granular polysilicon, the removed dust particles are taken off from the screening plant by means of a gas flow supplied to the screening plant, and the screening plant is of gas-tight design and supply and takeoff of the gas flow are effected such that the screening plant is at a positive pressure compared to the surroundings.

公开(公告)号：US20190247859A1

公开(公告)日：2019-08-15

申请号：US16067845

申请日：2016-11-07

Applicant: WACKER CHEMIE AG

Inventor： Eckhard HANELT ,  Michael FRICKE

IPC: B02C19/06 ,  C01B33/02

CPC classification number: B02C19/068 ,  B02C19/06 ,  C01B33/02 ,  C01P2004/51 ,  C01P2004/61 ,  H01M4/386 ,  H01M10/0525

Abstract: The object of the invention are methods for the production of silicon particles by grinding silicon-containing solids in a jet mill using a grinding fluid containing water vapor.

公开(公告)号：US20230416907A1

公开(公告)日：2023-12-28

申请号：US18037365

申请日：2020-11-30

Applicant: WACKER CHEMIE AG

Inventor： Michael FRICKE ,  Moritz BECKER ,  Claudia KLEINLEIN ,  Jürgen PFEIFFER ,  Sebastian SUCKOW

IPC: C23C16/24 ,  C23C16/442 ,  C23C16/04 ,  C23C16/44 ,  C23C16/455 ,  H01M4/36 ,  H01M4/38 ,  H01M4/587 ,  C01B33/02 ,  C01B33/04

CPC classification number: C23C16/24 ,  C23C16/442 ,  C23C16/045 ,  C23C16/4417 ,  C23C16/45523 ,  H01M4/366 ,  H01M4/386 ,  H01M4/587 ,  C01B33/02 ,  C01B33/043 ,  H01M2004/027

Abstract: Silicon-containing materials along with process for producing and uses for the same. The process includes reacting the silicon-containing materials in a fluidized bed reactor by deposition of silicon from at least one silicon precursor in pores and on the surface of porous particles. A fluidizing gas stream is provided within the fluidized bed reactor that is fully or partly induced to oscillate in a pulsed manner and propagates in the form of a wave and acts on the fluidized bed so as to form a homogeneously fluidized bed as a pulsed gas stream so as to form a homogeneously fluidized bed having a fluidization index FI of at least 0.95. Where the fluidizing gas stream has a superficial velocity which is above a measured minimum fluidization velocity of the pulsed gas stream and where the pulsation is combined with mechanical stirring as a further fluidizing aid.

公开(公告)号：US20170204520A1

公开(公告)日：2017-07-20

申请号：US15326522

申请日：2015-08-26

Applicant: Wacker Chemie AG

Inventor： Gerhard FORSTPOINTNER ,  Bernhard BAUMANN ,  Michael FRICKE

IPC: C23C24/04

Abstract: Plastic material-comprising surfaces of a substrate are coated with elemental silicon by cold gas spraying by injecting a powder containing silicon into a gas and powder with a high velocity onto the substrate surface, such that the silicon forms a firmly adherent coat on the substrate surface comprising the plastics material. Apparatuses having such silicon-coated surfaces are useful in minimizing contamination of polycrystalline silicon production, processing, packaging, and transport.