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1.发明授权公开(公告)号：US06946411B2
公开(公告)日：2005-09-20
申请号：US10621663
申请日：2003-07-17
Applicant: Uwe Knappe , Jan Raebiger , Uwe Schulze , Rolf Seltmann
Inventor： Uwe Knappe , Jan Raebiger , Uwe Schulze , Rolf Seltmann
CPC classification number: G05B19/19 , G05B2219/45031 , G05B2219/49113 , Y10S438/907
Abstract: A technique is disclosed that allows alignment of substrates on a run-to-run basis by using the position data of one or more previously aligned substrates to determine a setpoint of a pre-alignment process for one or more subsequent substrates. The setpoint may also be determined on the basis of a predefined characteristic of the substrates to be aligned.
Abstract translation: 公开了一种技术，其允许通过使用一个或多个先前对准的基板的位置数据在运行基础上对准基板，以确定一个或多个后续基板的预对准过程的设定点。 也可以基于待对准的基板的预定特性来确定设定点。
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2.发明授权Method and system for advanced process control including tool dependent machine constants 有权用于高级过程控制的方法和系统，包括与工具相关的机器常数公开(公告)号：US07403832B2
公开(公告)日：2008-07-22
申请号：US11379092
申请日：2006-04-18
Applicant: Uwe Schulze , Uwe Knappe
Inventor： Uwe Schulze , Uwe Knappe
IPC: G06F19/00
CPC classification number: G05B13/048
Abstract: A controller and a method of controlling a process tool is provided, in which machine constants used for calibrating manipulated variables of the control algorithm are explicitly introduced into the process model, thereby providing an enhanced controller behavior immediately after the introduction of new measurement values of the machine constants.
Abstract translation: 提供了一种控制器和控制处理工具的方法，其中用于校准控制算法的操纵变量的机器常数被明确地引入到过程模型中，从而在引入新的测量值之后立即提供增强的控制器行为 机器常数。
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3.发明申请METHOD AND SYSTEM FOR ADVANCED PROCESS CONTROL INCLUDING TOOL DEPENDENT MACHINE CONSTANTS 有权用于高级工艺控制的方法和系统，包括工具依赖机器常数公开(公告)号：US20060271225A1
公开(公告)日：2006-11-30
申请号：US11379092
申请日：2006-04-18
Applicant: Uwe Schulze , Uwe Knappe
Inventor： Uwe Schulze , Uwe Knappe
IPC: G06F19/00
CPC classification number: G05B13/048
Abstract: A controller and a method of controlling a process tool is provided, in which machine constants used for calibrating manipulated variables of the control algorithm are explicitly introduced into the process model, thereby providing an enhanced controller behavior immediately after the introduction of new measurement values of the machine constants.
Abstract translation: 提供了一种控制器和控制处理工具的方法，其中用于校准控制算法的操纵变量的机器常数被明确地引入到过程模型中，从而在引入新的测量值之后立即提供增强的控制器行为 机器常数。
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4.发明申请Method and system for contamination detection and monitoring a lithographic exposure tool and operating method for the same under controlled atmospheric conditions 审中-公开污染检测和监测光刻曝光工具的方法和系统及其在受控大气条件下的操作方法公开(公告)号：US20060066824A1
公开(公告)日：2006-03-30
申请号：US11135721
申请日：2005-05-24
Applicant: Uwe Knappe , Uzodinma Okoroanyanwu
Inventor： Uwe Knappe , Uzodinma Okoroanyanwu
IPC: G03B27/52
CPC classification number: G03F7/70916 , G03F7/70925
Abstract: By using highly efficient detection techniques, such as chromatography and absorption spectroscopy, one or more contaminants may be identified and the concentration thereof may quantitatively be determined. In this way, the adverse effect on critical components of exposure tools, such as reticles and lenses in the form of, for instance, deposited inorganic salts, may significantly be reduced and the process performance may be enhanced.
Abstract translation: 通过使用诸如色谱和吸收光谱的高效检测技术，可以鉴定一种或多种污染物并定量确定其浓度。 以这种方式，可以显着地减少曝光工具的关键部件的不利影响，例如掩模版和例如沉积的无机盐形式的透镜，并且可以提高工艺性能。
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