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1.依法登记的发明公开(公告)号：USH2209H
公开(公告)日：2008-02-05
申请号：US82580004
申请日：2004-04-14
Applicant: US NAVY
Inventor： LEONHARDT DARRIN , WALTON SCOTT G , MEGER ROBERT A , MURATORE CHRISTOPHER
CPC classification number: C23C14/022 , C23C14/205
Abstract: A large area metallization pretreatment and surface activation system that uses an electron beam-produced plasma capable of delivering substantial ion and radical fluxes at low temperatures over large areas of an organic plastic or polymer material. The ion and radical fluxes physically and chemically alter the surface structure of the organic plastic or polymer material thereby improving the ability of a film to adhere to the material.
Abstract translation: 使用电子束产生的等离子体的大面积金属化预处理和表面活化系统，其能够在有机塑料或聚合物材料的大面积上在低温下输送大量离子和自由基熔剂。 离子和自由基通量物理和化学改变有机塑料或聚合物材料的表面结构，从而提高膜粘附到材料上的能力。
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2.依法登记的发明公开(公告)号：USH2212H
公开(公告)日：2008-04-01
申请号：US67226903
申请日：2003-09-26
Applicant: US NAVY
Inventor： WALTON SCOTT G , MEGER ROBERT , FERNSLER RICHARD , LEONHARDT DARRIN
CPC classification number: H01J37/32623 , H01J3/025 , H01J37/3233 , H01J37/3266 , H05H2001/488
Abstract: An ion-ion plasma source, that features a processing chamber containing a large concentration of halogen or halogen-based gases. A second chamber is coupled to the processing chamber and features an electron source which produces a high energy electron beam. The high energy electron beam is injected into the processing chamber where it is shaped and confined by a means for shaping and confining the high energy electron beam. The high energy electron beam produced in the second chamber when injected into the processing chamber ionizes the halogen gas creating a dense, ion-ion plasma in the processing chamber that is continuous in time. A method for creating an ion-ion plasma continuous in time.
Abstract translation: 离子离子源，其特征在于包含大量卤素或卤素气体的处理室。 第二室耦合到处理室并且具有产生高能电子束的电子源。 高能电子束被注入到处理室中，在其中被高能电子束成形和限制的装置成形和限制。 当注入到处理室中时，在第二室中产生的高能电子束使卤素气体离子化，从而在处理室中产生致密的离子等离子体，其在时间上是连续的。 一种在时间上产生离子等离子体连续的方法。
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