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Patent Agency Ranking
公开(公告)号：US11768437B2
公开(公告)日：2023-09-26
申请号：US17867318
申请日：2022-07-18
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Sagar Deepak Khivsara , Kuo-An Liu , Chieh Hsieh , Shang-Chieh Chien , Gwan-Sin Chang , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Chung-Wei Wu , Zhiqiang Wu
CPC classification number: G03F7/70033 , G03F7/705 , G03F7/70166 , G03F7/70916 , G03F7/70933
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
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公开(公告)号：US11647578B2
公开(公告)日：2023-05-09
申请号：US17462563
申请日：2021-08-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Cho-Ying Lin , Sagar Deepak Khivsara , Hsiang Chen , Chieh Hsieh , Sheng-Kang Yu , Shang-Chieh Chien , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Zhiqiang Wu
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/7055 , G03F7/7085 , H05G2/006
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US20240389215A1
公开(公告)日：2024-11-21
申请号：US18787736
申请日：2024-07-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Cho-Ying Lin , Sagar Deepak Khivsara , Hsiang Chen , Chieh Hsieh , Sheng-Kang Yu , Shang-Chieh Chien , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Zhiqiang Wu
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US12174545B2
公开(公告)日：2024-12-24
申请号：US18361254
申请日：2023-07-28
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Sagar Deepak Khivsara , Kuo-An Liu , Chieh Hsieh , Shang-Chieh Chien , Gwan-Sin Chang , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Chung-Wei Wu , Zhiqiang Wu
IPC: G03F7/00
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
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公开(公告)号：US12096544B2
公开(公告)日：2024-09-17
申请号：US18298927
申请日：2023-04-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu Chen , Cho-Ying Lin , Sagar Deepak Khivsara , Hsiang Chen , Chieh Hsieh , Sheng-Kang Yu , Shang-Chieh Chien , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Zhiqiang Wu
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/7055 , G03F7/7085 , H05G2/006
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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