公开(公告)号：US20110186735A1

公开(公告)日：2011-08-04

申请号：US13020098

申请日：2011-02-03

申请人： Tadashi FUJIEDA ,  Makoto Okai ,  Takashi Ohshima ,  Boklae Cho

发明人： Tadashi FUJIEDA ,  Makoto Okai ,  Takashi Ohshima ,  Boklae Cho

IPC分类号： G21K7/00 ,  B01J19/08 ,  H01J9/04

CPC分类号： B01J19/08 ,  G21K7/00 ,  H01J9/04 ,  H01J2237/06316

摘要： An electron source is implemented which has a lower work function of an electron emission surface, yields emitted electrons of a narrower energy bandwidth and higher current density, and lasts longer than existing Zr/O/W electron sources. Further, an electron microscope which yields an image of higher-resolution in a shorter time and an electron beam lithography device which yields higher throughput are also provided. The electron source comprises a needle-shaped electrode made of metal having its tip in a needle shape, a heating body which heats up the needle-shaped electrode, and a diffusion source capable of being heated up by the heating body and made of a mixture of barium composite containing oxygen and carbon particles.

摘要翻译： 实现了具有较低的电子发射表面功函数的电子源，产生较窄的能带宽和较高电流密度的发射电子，并且比现有的Zr / O / W电子源持续时间更长。 此外，还提供了在更短时间内产生更高分辨率的图像的电子显微镜以及产生较高产量的电子束光刻装置。 电子源包括由针尖形状的金属构成的针状电极，加热针状电极的加热体和能够被加热体加热并由混合物构成的扩散源 的含有氧和碳颗粒的钡复合物。

公开(公告)号：US08766542B2

公开(公告)日：2014-07-01

申请号：US13577998

申请日：2011-01-19

申请人： Boklae Cho ,  Shigeru Kokubo ,  Hisaya Murakoshi ,  Hisao Nitta

发明人： Boklae Cho ,  Shigeru Kokubo ,  Hisaya Murakoshi ,  Hisao Nitta

IPC分类号： H01J7/24

CPC分类号： H01J29/98 ,  H01J37/073 ,  H01J2237/022 ,  H01J2237/0653 ,  H01J2237/1825

摘要： The disclosed charged particle beam apparatus includes a field-emission electron source including single crystal of tungsten; a vacuum chamber having the electron source therein; an exhausting system for exhausting the vacuum chamber; a filament connected to the electron source to let flow a current through the electron source and thereby heat the electron source; a power supply for letting a current flow through the filament; an ammeter for measuring a total current emitted from the electron source; and a controlling unit for exercising control to cause the power supply to let a current flow through the filament when the total current measured periodically has become a predetermined ratio or less as compared with a total current from the electron source found immediately after first electron beam emission, or a total current from the electron beam found immediately after a current is let flow through the filament.

摘要翻译： 所公开的带电粒子束装置包括：场致发射电子源，其包括钨的单晶; 其中具有电子源的真空室; 用于排出真空室的排气系统; 连接到电子源的灯丝，使电流流过电子源，从而加热电子源; 用于使电流流过灯丝的电源; 用于测量从电子源发射的总电流的电流表; 以及控制单元，用于当与在第一电子束发射之后立即发现的电子源的总电流相比，当周期性测量的总电流已经变为预定比率或更小时，进行控制以使电源使电流流过灯丝 ，或者在电流流过灯丝之后立即发现来自电子束的总电流。

公开(公告)号：US20120104272A1

公开(公告)日：2012-05-03

申请号：US13381343

申请日：2010-06-11

申请人： Boklae Cho ,  Shigeru Kokubo ,  Hisaya Murakoshi

发明人： Boklae Cho ,  Shigeru Kokubo ,  Hisaya Murakoshi

IPC分类号： G21K5/00 ,  H01J3/26

CPC分类号： H01J37/06 ,  H01J37/1472 ,  H01J37/18 ,  H01J2237/06316

摘要： The present invention provides a charged particle gun including: a charged particle source (1); an extraction electrode (2); an opening (14) through which a charged particle beam passes; and a barrier provided in an area defined by connecting the charged particle source to the opening, the barrier serving to prevent molecules existing in a downstream vacuum chamber from passing through the opening to adsorb onto the charged particle source. Accordingly, the molecules existing in the downstream lower-vacuum chamber can be prevented from adsorbing onto the charged particle source, so that current noise can be reduced. This enables stable operations of the charged particle beam gun and a charged particle beam device including the charged particle beam gun.

摘要翻译： 本发明提供一种带电粒子枪，包括：带电粒子源（1）; 提取电极（2）; 带电粒子束通过的开口（14）; 以及设置在通过将带电粒子源连接到开口所限定的区域中的屏障，所述屏障用于防止存在于下游真空室中的分子通过所述开口以吸附到带电粒子源上。 因此，可以防止存在于下游下真空室中的分子吸附到带电粒子源上，从而可以降低电流噪声。 这使得带电粒子束枪和包括带电粒子束枪的带电粒子束装置的稳定操作成为可能。

公开(公告)号：US20130200788A1

公开(公告)日：2013-08-08

申请号：US13577998

申请日：2011-01-19

申请人： Boklae Cho ,  Shigeru Kokubo ,  Hisaya Murakoshi ,  Hisao Nitta

发明人： Boklae Cho ,  Shigeru Kokubo ,  Hisaya Murakoshi ,  Hisao Nitta

IPC分类号： H01J29/98

CPC分类号： H01J29/98 ,  H01J37/073 ,  H01J2237/022 ,  H01J2237/0653 ,  H01J2237/1825

摘要： The disclosed charged particle beam apparatus includes a field-emission electron source including single crystal of tungsten; a vacuum chamber having the electron source therein; an exhausting system for exhausting the vacuum chamber; a filament connected to the electron source to let flow a current through the electron source and thereby heat the electron source; a power supply for letting a current flow through the filament; an ammeter for measuring a total current emitted from the electron source; and a controlling unit for exercising control to cause the power supply to let a current flow through the filament when the total current measured periodically has become a predetermined ratio or less as compared with a total current from the electron source found immediately after first electron beam emission, or a total current from the electron beam found immediately after a current is let flow through the filament.

摘要翻译： 所公开的带电粒子束装置包括：场致发射电子源，其包括钨的单晶; 其中具有电子源的真空室; 用于排出真空室的排气系统; 连接到电子源的灯丝，使电流流过电子源，从而加热电子源; 用于使电流流过灯丝的电源; 用于测量从电子源发射的总电流的电流表; 以及控制单元，用于当与在第一电子束发射之后立即发现的电子源的总电流相比，当周期性测量的总电流已经变为预定比率或更小时，进行控制以使电源使电流流过灯丝 ，或者在电流流过灯丝之后立即发现来自电子束的总电流。