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    CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE
    1.
    发明公开
    CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE 审中-公开

    公开(公告)号：US20230273521A1

    公开(公告)日：2023-08-31

    申请号：US18006987

    申请日：2021-07-07

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Daisuke OJIMA ,  Yuta YAMAMOTO ,  Akiya KAWAUE

    IPC: G03F7/039

    CPC classification number: G03F7/0392

    Abstract: A chemically amplified positive-type photosensitive composition capable of forming a patterned resist film having a square cross-section of a nonresist portion and good plating liquid resistance, even when forming a thick patterned resist film; a photosensitive dry film including a photosensitive layer consisting of the photosensitive composition; a production method of a substrate having a template for plating using the photosensitive composition; and a production method of a plated article using the substrate having the template formed by the aforementioned method. An acrylic resin having a constituent unit derived from a crosslinkable monomer which meets predetermined requirements as a resin is added to a chemically amplified positive-type photosensitive composition containing an acid generator which generates an acid by irradiation of active rays or radioactive rays and the resin, and a calculated value of glass transition temperature of hypothetical non-crosslinked acrylic resin which the constituent unit is excluded from the acrylic resin is set to 90° C. or higher and 120° C. or lower.

    CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING A PLATED ARTICLE
    4.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING A PLATED ARTICLE 有权

    公开(公告)号：US20230102353A1

    公开(公告)日：2023-03-30

    申请号：US17757502

    申请日：2020-12-01

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Yusuke KISHIMOTO ,  Akiya KAWAUE

    IPC: G03F7/039

    Abstract: A chemically amplified positive-type photosensitive resin composition with which a resist pattern having a rectangular cross-sectional shape is easily formed, which has satisfactory sensitivity, and which can suppress decomposition of the acid generating agent; a photosensitive dry film having a photosensitive layer including the photosensitive resin composition; a method for producing the photosensitive dry film; a method for producing a patterned resist film using the positive-type photosensitive resin composition; a method for producing a substrate provided with a template using the positive-type photosensitive resin composition; and a method for producing a plated article using the positive-type photosensitive resin composition. The photosensitive resin composition includes an acid generating agent to generate an acid by irradiation with an active ray or radiation, a resin having alkali solubility that increases under action of an acid, and an acid diffusion suppressing agent, wherein the acid generating agent includes a non-ionic acid generating agent that generates sulfonic acid upon the irradiation, and the acid diffusion suppressing agent includes a compound having a specific structure that is decomposed by the irradiation.

    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
    5.
    发明申请
    METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE 审中-公开

    公开(公告)号：US20190276698A1

    公开(公告)日：2019-09-12

    申请号：US16335129

    申请日：2017-09-26

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Takahiro DAZAI ,  Hitoshi YAMANO ,  Akiya KAWAUE ,  Ken MIYAGI

    IPC: C09D153/00

    Abstract: A method of producing a structure containing a phase-separated structure, including: a step of using a resin composition for forming a phase-separated structure including a block copolymer and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety to form a BCP layer (3) containing a block copolymer on a substrate (1); and a step of vaporizing at least a part of the compound (IL), and phase-separating the BCP layer (3) to obtain a structure (3′) containing a phase-separated structure.

    METHOD FOR MANUFACTURING POLYMER COMPOUND
    7.
    发明申请
    METHOD FOR MANUFACTURING POLYMER COMPOUND 审中-公开

    公开(公告)号：US20170166664A1

    公开(公告)日：2017-06-15

    申请号：US15369471

    申请日：2016-12-05

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Masatoshi ARAI ,  Yoshitaka KOMURO ,  Akiya KAWAUE

    IPC: C08F8/00

    CPC classification number: C08F8/00 ,  C08F220/18 ,  C08F224/00 ,  C08F228/00 ,  C08F2230/085

    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).

    BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
    10.
    发明申请
    BRUSH COMPOSITION, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE 有权
    刷子组合物及其生产包含相分离结构的结构的方法

    公开(公告)号：US20160194751A1

    公开(公告)日：2016-07-07

    申请号：US14957922

    申请日：2015-12-03

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Masahito YAHAGI ,  Takaya MAEHASHI ,  Akiya KAWAUE ,  Issei SUZUKI ,  Tasuku MATSUMIYA ,  Tsuyoshi KUROSAWA ,  Hitoshi YAMANO

    IPC: C23C14/58 ,  C09D153/00

    CPC classification number: B05D1/38 ,  B05D3/0254 ,  B05D7/52 ,  C09D153/00 ,  G03F7/0002

    Abstract: A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5.

    Abstract translation: 一种刷组合物，用于相分离含有在基材上形成的具有多种结块的嵌段共聚物的层，所述刷组合物包含树脂组分，所述树脂组分具有由式（u1）表示的结构单元（u1） -1），并且在其主链的至少一个末端部分具有羟基：在式（u1-1）中，R表示氢原子，1〜5个碳原子的烷基或卤代烷基 1至5个碳原子; R 1表示卤素原子或任选含有氧原子，卤素原子或硅原子的碳原子数1〜20的直链状，支链状或环状的烃基，或者直链状，支链状或环状的烃基的组合。 p表示1〜5的整数。

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