公开(公告)号：US20090283705A1

公开(公告)日：2009-11-19

申请号：US12418237

申请日：2009-04-03

Applicant: THOMAS PARRILL ,  ADITYA AGARWAL

Inventor： THOMAS PARRILL ,  ADITYA AGARWAL

IPC: H01J37/08 ,  B01D59/44 ,  H01J49/00

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/20 ,  H01J2237/2007

Abstract: Ion implanters are especially suited to meet process dose and energy demands associated with fabricating photovoltaic devices by ion implantation followed by cleaving.

Abstract translation: 离子注入机特别适用于通过离子注入和裂解来制造与制造光伏器件相关的工艺剂量和能量需求。