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公开(公告)号:US20200287033A1
公开(公告)日:2020-09-10
申请号:US16294687
申请日:2019-03-06
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Chang Soo SUH , Sameer Prakash PENDHARKAR , Naveen TIPIRNENI , Jungwoo JOH
IPC: H01L29/778 , H01L29/66 , H01L29/20 , H01L21/02 , H01L21/308 , H01L29/417 , H01L29/423
Abstract: In some examples, a gallium nitride (GaN)-based transistor, comprises a substrate; a GaN layer supported by the substrate; an aluminum nitride gallium (AlGaN) layer supported by the GaN layer; a p-doped GaN structure supported by the AlGaN layer; and multiple p-doped GaN blocks supported by the AlGaN layer, each of the multiple p-doped GaN blocks physically separated from the remaining multiple p-doped GaN blocks, wherein first and second contours of a two-dimensional electron gas (2DEG) of the GaN-based transistor are at an interface of the AlGaN and GaN layers.
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公开(公告)号:US20200303535A1
公开(公告)日:2020-09-24
申请号:US16895111
申请日:2020-06-08
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Jungwoo JOH , Naveen TIPIRNENI , Chang Soo SUH , Sameer PENDHARKAR
IPC: H01L29/778 , H01L21/265 , H01L21/266 , H01L21/308 , H01L29/06 , H01L29/08 , H01L29/20 , H01L29/417 , H01L29/66
Abstract: A High Electron Mobility Transistor (HEMT) includes an active layer on a substrate, and a Group IIIA-N barrier layer on the active layer. An isolation region is through the barrier layer to provide at least one isolated active area including the barrier layer on the active layer. A gate is over the barrier layer. A drain includes at least one drain finger including a fingertip having a drain contact extending into the barrier layer to contact to the active layer and a source having a source contact extending into the barrier layer to contact to the active layer. The source forms a loop that encircles the drain. The isolation region includes a portion positioned between the source and drain contact so that there is a conduction barrier in a length direction between the drain contact of the fingertip and the source.
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公开(公告)号:US20180151713A1
公开(公告)日:2018-05-31
申请号:US15864157
申请日:2018-01-08
Applicant: Texas Instruments Incorporated
Inventor: Jungwoo JOH , Naveen TIPIRNENI , Chang Soo SUH , Sameer PENDHARKAR
IPC: H01L29/778 , H01L29/66 , H01L29/417 , H01L29/20 , H01L29/08 , H01L21/265 , H01L29/06 , H01L21/308 , H01L21/266
Abstract: A High Electron Mobility Transistor (HEMT) includes an active layer on a substrate, and a Group IIIA-N barrier layer on the active layer. An isolation region is through the barrier layer to provide at least one isolated active area including the barrier layer on the active layer. A gate is over the barrier layer. A drain includes at least one drain finger including a fingertip having a drain contact extending into the barrier layer to contact to the active layer and a source having a source contact extending into the barrier layer to contact to the active layer. The source forms a loop that encircles the drain. The isolation region includes a portion positioned between the source and drain contact so that there is a conduction barrier in a length direction between the drain contact of the fingertip and the source.
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公开(公告)号:US20210280702A1
公开(公告)日:2021-09-09
申请号:US17330012
申请日:2021-05-25
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Chang Soo SUH , Sameer Prakash PENDHARKAR , Naveen TIPIRNENI , Jungwoo JOH
IPC: H01L29/778 , H01L29/66 , H01L29/20 , H01L29/423 , H01L21/308 , H01L29/417 , H01L21/02
Abstract: In some examples, a gallium nitride (GaN)-based transistor, comprises a substrate; a GaN layer supported by the substrate; an aluminum nitride gallium (AlGaN) layer supported by the GaN layer; a p-doped GaN structure supported by the AlGaN layer; and multiple p-doped GaN blocks supported by the AlGaN layer, each of the multiple p-doped GaN blocks physically separated from the remaining multiple p-doped GaN blocks, wherein first and second contours of a two-dimensional electron gas (2DEG) of the GaN-based transistor are at an interface of the AlGaN and GaN layers.
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