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公开(公告)号：US20250051919A1
公开(公告)日：2025-02-13
申请号：US18796269
申请日：2024-08-06
Applicant: TES CO., LTD
Inventor： Shin-Myoung KIM , Hyun-Suk SONG , Hee-Won KIM
IPC: C23C16/458 , C23C16/52
Abstract: The present disclosure relates to a substrate processing apparatus and a substrate processing method, and more particularly, to a substrate processing apparatus and a substrate processing method for accurately accommodating a substrate at a central portion of a susceptor even when a tilt angle or a tilt direction of the susceptor on which the substrate is accommodated changes for each substrate or for each substrate process.
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