公开(公告)号：US11414523B2

公开(公告)日：2022-08-16

申请号：US16956041

申请日：2018-12-21

Applicant: TEIJIN LIMITED

Inventor： Taichi Kimura ,  Kazushi Tando ,  Koji Oda

IPC: C08G77/448 ,  C08K3/016 ,  C08F2/14 ,  C08K3/08 ,  C08K5/00 ,  C08K5/49

Abstract: A polycarbonate-polydiorganosiloxane copolymer or a resin composition thereof having excellent impact resistance, and, in particular, excellent impact resistance at extremely low temperatures, as well as excellent chemical resistance; and a production method for the resin composition are provided. This copolymer or resin composition thereof includes a polycarbonate-polydiorganosiloxane copolymer and an optional polycarbonate resin. The copolymer includes a polycarbonate block (A-1) and a polydiorganosiloxane block (A-2). The polydiorganosiloxane block (A-2) content of the copolymer or resin composition thereof is 2.5-8.0 wt %. The copolymer or resin composition thereof satisfies (i) and (ii): (i) in a cross-sectional observation image of the copolymer or resin composition thereof that is generated using an electron beam microscope, there are 1-20 domains that have a longest diameter of at least 80 nm in an area that is 850 nm square (722,500 nm2); and (ii) average domain size is 30-100 nm.