公开(公告)号：US20020031979A1

公开(公告)日：2002-03-14

申请号：US09767881

申请日：2001-01-24

Applicant: TDK CORPORATION

Inventor： Toshimichi Sakurada ,  Yasutoshi Fujita ,  Masao Yamaguchi ,  Kazuo Orii ,  Isao Saito

IPC: B24B051/00

CPC classification number: B24B53/017 ,  B24B37/048 ,  G11B5/3103 ,  G11B5/3116 ,  G11B5/3163

Abstract: Disclosed is a method of polishing a magnetic head slider whereby a by-processed step can be easily reduced. An air bearing surface of the magnetic head slider is polished with setting a bar that includes the magnetic head slider where a thin film magnetic head element is formed to reciprocate in a radius direction of a polishing plate, as well as rotating the polishing plate having a polishing surface. Polishing steps include a first polishing step of performing a height polish while rotating the polishing plate at a first velocity, and a second polishing step of performing a finishing polish while rotating the polishing plate at a second velocity sufficiently lower than the first velocity. The second velocity at the second polishing step is set so that an average linear velocity in the direction of the rotation of the polishing plate is equal to or lower than 0.032 m/s (preferably equal to or lower than 0.008 m/s). Consequently, the by-processed step that is generated on the air bearing surface of the magnetic head slider is reduced.

Abstract translation: 公开了一种抛光磁头滑块的方法，由此可以容易地减少逐步处理的步骤。 通过设置包括磁头滑块的棒来抛光磁头滑块的空气轴承表面，其中薄膜磁头元件形成为沿研磨板的半径方向往复运动，并且旋转具有 抛光面。 研磨步骤包括在以第一速度旋转抛光板的同时进行高度抛光的第一抛光步骤，以及在以足够低于第一速度的第二速度旋转抛光板的同时进行抛光的第二抛光步骤。 将第二研磨工序的第二速度设定为使抛光板的旋转方向的平均线速度为0.032m / s以下（优选为0.008m / s以下）。 因此，在磁头滑块的空气轴承表面上产生的副处理步骤减少。

公开(公告)号：US20030020467A1

公开(公告)日：2003-01-30

申请号：US10195106

申请日：2002-07-15

Applicant: TDK CORPORATION

Inventor： Noriaki Kasahara ,  Nozomu Hachisuka ,  Yasutoshi Fujita

IPC: G01B007/14 ,  G01R033/12

CPC classification number: B82Y25/00 ,  G01R33/093 ,  G11B5/3116 ,  G11B5/3166 ,  G11B5/3903 ,  Y10T29/49041 ,  Y10T29/53165

Abstract: Disclosed is a lapping monitor element that is juxtaposed with a magnetic transducer element having a magnetoresistance effect film to determine the lapping position upon lapping the element height of the magnetic transducer element to a predetermined dimension, the lapping monitor element comprising a resistance film to be resistance measured, the resistance film being a metal film of nonmagnetic transition metal or of alloy composed mainly of nonmagnetic transition metal, or a multilayered film where two or more such metal films are laid one upon another, thereby making it possible to extremely stabilize the ELG sensor resistance measured values upon lapping as well as to provide a high accuracy MR height control.

Abstract translation: 公开了一种研磨监测元件，其与具有磁阻效应膜的磁换能器元件并置，以在将磁换能器元件的元件高度研磨到预定尺寸时确定研磨位置，研磨监测元件包括电阻膜 电阻膜是由非磁性过渡金属或非磁性过渡金属组成的非磁性过渡金属或合金的金属膜，或其中两个或更多个这样的金属膜彼此层叠的多层膜，从而使得ELG传感器 研磨时的电阻测量值以及提供高精度MR高度控制。