公开(公告)号：US09863754B2

公开(公告)日：2018-01-09

申请号：US14486514

申请日：2014-09-15

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Wei-Hsiang Tseng ,  Chin-Hsiang Lin ,  Heng-Hsin Liu ,  Jui-Chun Peng ,  Ho-Ping Cheng

IPC: G01B11/00 ,  G01B11/02 ,  G03F9/00 ,  H01L23/544

CPC classification number: G01B11/02 ,  G03F9/7011 ,  G03F9/7084 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A wafer alignment apparatus includes a light source, a light detection device, and a rotation device configured to rotate a wafer. The light source is configured to provide light directed to the wafer. The light detection device is configured to detect reflected light intensity from the wafer to locate at least one wafer alignment mark of wafer alignment marks separated by a plurality of angles. At least two of those angles are equal.