MACHINE LEARNING ON OVERLAY MANAGEMENT

    公开(公告)号:US20220269184A1

    公开(公告)日:2022-08-25

    申请号:US17185827

    申请日:2021-02-25

    IPC分类号: G03F7/20 G06N20/00 G06K9/62

    摘要: The current disclosure describes techniques for managing vertical alignment or overlay in semiconductor manufacturing using machine learning. Alignments of interconnection features in a fan-out WLP process are evaluated and managed through the disclosed techniques. Big data and machine learning are used to train a classification that correlates the overlay error source factors with overlay metrology categories. The overlay error source factors include tool signals. The trained classification includes a base classification and a Meta classification.