公开(公告)号：US20020058198A1

公开(公告)日：2002-05-16

申请号：US09948521

申请日：2001-09-08

Applicant: Shipley Company, L.L.C.

Inventor： Axel Klauck-Jacobs ,  Anthony Zampini ,  Sungseo Cho ,  Shintaro Yamada

IPC: G03F007/038

CPC classification number: G03F7/0382 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention contain a polymer that has fluorinated phenolic units and photoacid-labile groups. Resists of the invention can be effectively imaged at short wavelengths such as sub-200 nm, particularly 157 nm.

Abstract translation: 本发明包括聚合物和光致抗蚀剂组合物，其包含作为树脂粘合剂组分的聚合物。 本发明的光刻胶含有具有氟化酚单元和光致酸不稳定基团的聚合物。 可以在短波长例如亚200nm，特别是157nm下有效地成像本发明的抗体。