Light emitting apparatus and light radiator including the same

    公开(公告)号:US12044367B2

    公开(公告)日:2024-07-23

    申请号:US18223751

    申请日:2023-07-19

    CPC classification number: F21K9/69 G02B19/0066 F21Y2105/16 F21Y2115/10

    Abstract: A light emitting device includes a substrate, a plurality of light emitting diodes, a window, and a reflector. The substrate has a first region and a second region. The plurality of light emitting diodes are disposed on the first region of the substrate. The window has a dome shape and is disposed to cover the first region. The window is configured to control a traveling path of light emitted from the plurality of light emitting diodes. The reflector is configured to support the window and reflect the light emitted from the plurality of light emitting diodes. The reflector has an opening that exposes the plurality of light emitting diodes disposed on the substrate. A distance between two adjacent light emitting diodes of the plurality of light emitting diodes can be 500 micrometers or less.

    STERILIZING DEVICE
    2.
    发明申请

    公开(公告)号:US20230128525A1

    公开(公告)日:2023-04-27

    申请号:US18069666

    申请日:2022-12-21

    Abstract: A sterilizing device includes a pipe having an inlet and an outlet and allowing fluid to move therethrough and a light source provided on one side of the pipe and providing light to the fluid. At least a portion of the pipe is provided in a spiral shape and the inlet and/or the outlet are arranged in a light emitting region.

    UV light emitting diode and method of fabricating the same
    5.
    发明授权
    UV light emitting diode and method of fabricating the same 有权
    UV发光二极管及其制造方法

    公开(公告)号:US09543476B2

    公开(公告)日:2017-01-10

    申请号:US14556033

    申请日:2014-11-28

    CPC classification number: H01L33/32 H01L33/06

    Abstract: A UV light emitting diode and a method of fabricating the same are provided. The light emitting diode includes an active area between an n-type nitride-based semiconductor layer and a p-type nitride-based semiconductor layer, wherein the active area includes a plurality of barrier layers containing Al, a plurality of well layers containing Al and alternately arranged with the barrier layer, and at least one conditioning layer. Each conditioning layer is placed between the well layer and the barrier layer adjacent to the well layer and is formed of a binary nitride semiconductor. The design of the conditioning layer can reduce stress of the active area while allowing uniform control of the composition of the well layers and/or the barrier layers.

    Abstract translation: 提供了一种UV发光二极管及其制造方法。 发光二极管包括在n型氮化物基半导体层和p型氮化物基半导体层之间的有源区,其中有源区包括多个含有Al的势垒层,多个阱层含有Al和 交替布置有阻挡层,以及至少一个调理层。 每个调理层位于阱层和与阱层相邻的势垒层之间,并由二元氮化物半导体形成。 调节层的设计可以减少有源区的应力,同时允许均匀地控制阱层和/或阻挡层的组成。

    UV LIGHT EMITTING DIODE AND METHOD OF FABRICATING THE SAME

    公开(公告)号:US20180175245A1

    公开(公告)日:2018-06-21

    申请号:US15883774

    申请日:2018-01-30

    CPC classification number: H01L33/32 H01L33/007 H01L33/06

    Abstract: Exemplary embodiments provide a UV light emitting diode and a method of fabricating the same. The method of fabricating a UV light emitting diode includes growing a first n-type semiconductor layer including AlGaN, wherein growth of the first n-type semiconductor layer includes changing a growth pressure within a growth chamber and changing a flow rate of an n-type dopant source introduced into the growth chamber. A pressure change during growth of the first n-type semiconductor layer includes at least one cycle of a pressure increasing period and a pressure decreasing period over time, and change in flow rate of the n-type dopant source includes increasing the flow rate of the n-type dopant source in the form of at least one pulse. The UV light emitting diode fabricated by the method has excellent crystallinity.

    UV LIGHT EMITTING DIODE AND METHOD OF FABRICATING THE SAME
    8.
    发明申请
    UV LIGHT EMITTING DIODE AND METHOD OF FABRICATING THE SAME 有权
    紫外线发光二极管及其制造方法

    公开(公告)号:US20170033263A1

    公开(公告)日:2017-02-02

    申请号:US15294563

    申请日:2016-10-14

    CPC classification number: H01L33/32 H01L33/007 H01L33/06

    Abstract: Exemplary embodiments provide a UV light emitting diode and a method of fabricating the same. The method of fabricating a UV light emitting diode includes growing a first n-type semiconductor layer including AlGaN, wherein growth of the first n-type semiconductor layer includes changing a growth pressure within a growth chamber and changing a flow rate of an n-type dopant source introduced into the growth chamber. A pressure change during growth of the first n-type semiconductor layer includes at least one cycle of a pressure increasing period and a pressure decreasing period over time, and change in flow rate of the n-type dopant source includes increasing the flow rate of the n-type dopant source in the form of at least one pulse. The UV light emitting diode fabricated by the method has excellent crystallinity.

    Abstract translation: 示例性实施例提供了一种UV发光二极管及其制造方法。 制造UV发光二极管的方法包括生长包括AlGaN的第一n型半导体层,其中第一n型半导体层的生长包括改变生长室内的生长压力并改变n型的流速 掺杂剂源引入生长室。 第一n型半导体层的生长期间的压力变化包括至少一个增压周期和随时间推移的压力降低周期,并且n型掺杂剂源的流量变化包括增加 n型掺杂剂源,其形式为至少一个脉冲。 通过该方法制造的UV发光二极管具有优异的结晶度。

    UV LIGHT EMITTING DIODE AND METHOD OF FABRICATING THE SAME
    9.
    发明申请
    UV LIGHT EMITTING DIODE AND METHOD OF FABRICATING THE SAME 有权
    紫外线发光二极管及其制造方法

    公开(公告)号:US20160027964A1

    公开(公告)日:2016-01-28

    申请号:US14810464

    申请日:2015-07-27

    CPC classification number: H01L33/32 H01L33/007 H01L33/06

    Abstract: Exemplary embodiments provide a UV light emitting diode and a method of fabricating the same. The method of fabricating a UV light emitting diode includes growing a first n-type semiconductor layer including AlGaN, wherein growth of the first n-type semiconductor layer includes changing a growth pressure within a growth chamber and changing a flow rate of an n-type dopant source introduced into the growth chamber. A pressure change during growth of the first n-type semiconductor layer includes at least one cycle of a pressure increasing period and a pressure decreasing period over time, and change in flow rate of the n-type dopant source includes increasing the flow rate of the n-type dopant source in the form of at least one pulse. The UV light emitting diode fabricated by the method has excellent crystallinity.

    Abstract translation: 示例性实施例提供了一种UV发光二极管及其制造方法。 制造UV发光二极管的方法包括生长包括AlGaN的第一n型半导体层,其中第一n型半导体层的生长包括改变生长室内的生长压力并改变n型的流速 掺杂剂源引入生长室。 第一n型半导体层的生长期间的压力变化包括至少一个增压周期和随时间推移的压力降低周期,并且n型掺杂剂源的流量变化包括增加 n型掺杂剂源,其形式为至少一个脉冲。 通过该方法制造的UV发光二极管具有优异的结晶度。

    Light emitting apparatus and light radiator including the same

    公开(公告)号:US11761592B2

    公开(公告)日:2023-09-19

    申请号:US17562433

    申请日:2021-12-27

    CPC classification number: F21K9/69 G02B19/0066 F21Y2105/16 F21Y2115/10

    Abstract: A light emitting apparatus includes a substrate, a plurality of light emitting structures, a window, and a reflector. The substrate has a luminous region and a non-luminous region. The plurality of light emitting structures is disposed on the luminous region of the substrate. The window has a dome shape and is disposed to cover the luminous region. The window is configured to control a traveling path of light emitted from the a plurality of light emitting structures. The reflector is configured to support the window and reflect the light emitted from the plurality of light emitting structures. The reflector has an opening that exposes the plurality of light emitting structures mounted on the substrate. A distance between two adjacent light emitting structures of the plurality of light emitting structures is 500 micrometers or less.

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