公开(公告)号：US07583491B2

公开(公告)日：2009-09-01

申请号：US11436471

申请日：2006-05-18

Applicant: Scott Peitzsch

Inventor： Scott Peitzsch

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H01J2237/0048 ,  H01J2237/2007 ,  H01J2237/31705 ,  H01L21/67011

Abstract: An ion implanter includes an electrostatic chuck. The electrostatic chuck is configured to repel charged particles from a surface of the electrostatic chuck to limit deposits of the charged particles on the surface when the electrostatic chuck is not supporting any workpiece. An electrostatic chuck including a dielectric layer and at least one electrode is also provided. The at least one electrode is configured to accept a DC voltage signal to produce a first charge to repel charged particles from the dielectric layer when the dielectric layer is not supporting any workpiece to thereby limit deposits of the charged particles on the dielectric layer.

Abstract translation: 离子注入机包括静电卡盘。 静电卡盘被配置为当静电卡盘不支撑任何工件时，从静电卡盘的表面排出带电粒子以限制带电粒子沉积在表面上。 还提供了包括电介质层和至少一个电极的静电卡盘。 所述至少一个电极被配置为当所述电介质层不支撑任何工件从而限制所述电介质层上带电粒子的沉积时，接受DC电压信号以产生第一电荷以从所述电介质层排斥带电粒子。