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85 条记录 (耗时 0.047 秒)

    Combined semiconductor metrology system
    1.
    发明授权
    Combined semiconductor metrology system 有权
    组合半导体计量系统

    公开(公告)号：US09553034B1

    公开(公告)日：2017-01-24

    申请号：US13533360

    申请日：2012-06-26

    申请人： Scott A. Young ,  Guoheng Zhao ,  NanChang Zhu ,  Neeraj Khanna

    发明人： Scott A. Young ,  Guoheng Zhao ,  NanChang Zhu ,  Neeraj Khanna

    IPC分类号： H01L21/66 ,  G01N21/95

    CPC分类号： H01L22/24 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/8845 ,  H01L22/12 ,  H01L22/20

    摘要： A semiconductor wafer inspection system includes a camera and two or more illuminators. The illuminators illuminate a line of the semiconductor wafer in sequence and the camera captures an interleaved image of illuminated lines such that the individual images can be recovered from the interleaved image. The semiconductor wafer can be moved by a conveyor so that adjacent lines can be sequentially illuminated by the illuminators. The camera may include two or more line sensors.

    摘要翻译： 半导体晶片检查系统包括相机和两个或更多个照明器。 照明器依次照射半导体晶片的一行，并且相机捕获照明线的交错图像，使得各个图像可以从交错图像中恢复。 半导体晶片可以通过输送机移动，使得相邻的线可以被照明器依次照明。 相机可以包括两个或更多个线传感器。

    Solar metrology methods and apparatus
    2.
    发明授权
    Solar metrology methods and apparatus 失效
    太阳能计量方法和装置

    公开(公告)号：US08604447B2

    公开(公告)日：2013-12-10

    申请号：US13557047

    申请日：2012-07-24

    申请人： Scott Young ,  Guoheng Zhao ,  Ady Levy ,  Marco Guevremont ,  Neeraj Khanna

    发明人： Scott Young ,  Guoheng Zhao ,  Ady Levy ,  Marco Guevremont ,  Neeraj Khanna

    IPC分类号： G01N21/64

    CPC分类号： G01N21/6489 ,  G01N21/9501 ,  H02S50/10

    摘要： Methods and apparatus are presented to measure the photoluminescence of incoming wafers and extract parameters such as minority carrier life time, diffusion length, and defect density that may be used to predict final solar cell efficiency. In some examples, illumination light is supplied to a side of an as-cut silicon wafer and the induced luminescence measured from the same side and the opposite side of the wafer is used to determine an indication of the minority carrier lifetime. In another example, the luminescence induced by two instances of illumination light of different wavelength is used to determine an indication of the minority carrier lifetime. In another example, the spatial distribution of luminescence intensity over an area surrounding a focused illumination spot is used to determine an indication of the minority carrier lifetime. Other apparatus useful to passivate the surface of a wafer for inspection are also presented.

    摘要翻译： 提出了测量进入晶片的光致发光的方法和装置，并提取可用于预测最终太阳能电池效率的参数，例如少数载流子寿命，扩散长度和缺陷密度。 在一些示例中，将照明光提供给切割硅晶片的一侧，并且使用从晶片的相同侧和相对侧测量的感应发光来确定少数载流子寿命的指示。 在另一示例中，由两个不同波长的照明光实例引起的发光用于确定少数载流子寿命的指示。 在另一示例中，使用聚焦照明点周围的区域上的发光强度的空间分布来确定少数载流子寿命的指示。 还提出了可用于钝化晶片表面以进行检查的其它装置。

    Solar Metrology Methods And Apparatus
    3.
    发明申请
    Solar Metrology Methods And Apparatus 失效
    太阳能计量方法与装置

    公开(公告)号：US20130048873A1

    公开(公告)日：2013-02-28

    申请号：US13557047

    申请日：2012-07-24

    申请人： Scott Young ,  Guoheng Zhao ,  Ady Levy ,  Marco Guevremont ,  Neeraj Khanna

    发明人： Scott Young ,  Guoheng Zhao ,  Ady Levy ,  Marco Guevremont ,  Neeraj Khanna

    IPC分类号： G01N21/64

    CPC分类号： G01N21/6489 ,  G01N21/9501 ,  H02S50/10

    摘要： Methods and apparatus are presented to measure the photoluminescence of incoming wafers and extract parameters such as minority carrier life time, diffusion length, and defect density that may be used to predict final solar cell efficiency. In some examples, illumination light is supplied to a side of an as-cut silicon wafer and the induced luminescence measured from the same side and the opposite side of the wafer is used to determine an indication of the minority carrier lifetime. In another example, the luminescence induced by two instances of illumination light of different wavelength is used to determine an indication of the minority carrier lifetime. In another example, the spatial distribution of luminescence intensity over an area surrounding a focused illumination spot is used to determine an indication of the minority carrier lifetime. Other apparatus useful to passivate the surface of a wafer for inspection are also presented.

    摘要翻译： 提出了测量进入晶片的光致发光的方法和装置，并提取可用于预测最终太阳能电池效率的参数，例如少数载流子寿命，扩散长度和缺陷密度。 在一些示例中，将照明光提供给切割硅晶片的一侧，并且使用从晶片的相同侧和相对侧测量的感应发光来确定少数载流子寿命的指示。 在另一示例中，由两个不同波长的照明光实例引起的发光用于确定少数载流子寿命的指示。 在另一示例中，使用聚焦照明点周围的区域上的发光强度的空间分布来确定少数载流子寿命的指示。 还提出了可用于钝化晶片表面以进行检查的其它装置。

    Composite Polarizer With Adjustable Polarization Angles
    4.
    发明申请
    Composite Polarizer With Adjustable Polarization Angles 有权
    具有可调极化角度的复合偏振器

    公开(公告)号：US20130293888A1

    公开(公告)日：2013-11-07

    申请号：US13883988

    申请日：2012-02-14

    申请人： Guoheng Zhao

    发明人： Guoheng Zhao

    IPC分类号： G02B27/28 ,  G01N21/21

    CPC分类号： G02B27/286 ,  G01N21/21 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8848 ,  G02B5/3066 ,  G02B27/283

    摘要： An adjustable, composite polarizer can include first and second plate polarizers and an adjusting apparatus. The adjusting apparatus can adjust a pitch angle and a roll angle for the first and second plate polarizers while maintaining a predetermined, minimal distance between those plates. In this configuration, the adjustable, composite polarizer can provide mirror symmetric polarization with respect to an incident plane while providing the flexibility of any polarization.

    摘要翻译： 可调节的复合偏振器可以包括第一和第二板偏振器和调节装置。 调节装置可以在保持这些板之间预定的最小距离的同时，调整第一和第二板偏振器的俯仰角和滚动角。 在这种配置中，可调整的复合偏振器可以提供相对于入射平面的镜对称极化，同时提供任何偏振的柔性。

    System for detecting anomalies and/or features of a surface
    6.
    发明授权
    System for detecting anomalies and/or features of a surface 有权
    用于检测表面的异常和/或特征的系统

    公开(公告)号：US07869023B2

    公开(公告)日：2011-01-11

    申请号：US12123393

    申请日：2008-05-19

    申请人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    发明人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501

    摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

    Fourier filters and wafer inspection systems
    9.
    发明授权
    Fourier filters and wafer inspection systems 有权
    傅立叶滤波器和晶圆检查系统

    公开(公告)号：US07345754B1

    公开(公告)日：2008-03-18

    申请号：US11228584

    申请日：2005-09-16

    申请人： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

    发明人： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

    IPC分类号： G01N21/00 ,  G02B27/46

    CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/956 ,  G03F7/7065

    摘要： Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.

    摘要翻译： 提供傅立叶滤波器和晶片检测系统。 一个实施例涉及被配置为包括在明场检查系统中的一维傅立叶滤波器，使得明场检查系统可以用于晶片的宽带暗视场检查。 傅里叶滤波器包括被配置为定位在检查系统的照明路径中的非对称照明孔。 傅立叶滤波器还包括与照明孔径互补的非对称成像孔。 成像孔被配置为定位在检查系统的光采集路径中，使得成像孔口阻挡从晶片上的结构反射和衍射的光，并允许从晶片上的缺陷散射的光通过成像孔。

    Sample inspection system
    10.
    发明授权
    Sample inspection system 有权

    公开(公告)号：US07119897B2

    公开(公告)日：2006-10-10

    申请号：US11007729

    申请日：2004-12-07

    申请人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/9501

    摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.