摘要:
A dispersion element includes a prism having a first transmission surface and an oppositely disposed second transmission surface, and an optical element having a third transmission surface and an oppositely disposed diffraction optical surface on which a diffraction grating is arranged. The prism and the optical element are integrated into one body by cementing the first transmission surface to the third transmission surface. The third transmission surface and the diffraction optical surface are non-parallel to each other in a plane perpendicular to grooves of the diffraction grating.
摘要:
A wavelength selective switch includes a substrate. On the substrate, the wavelength selective switch includes at least one input port, a dispersive element, a light converging element, a light deflecting member, an output port, and a driving mechanism which drives at least one of the dispersive element, the light condenser element, and the light deflecting member, and drive by the driving mechanism is a rotational drive around an axis perpendicular to the substrate, for the dispersive element, and is a translational drive in a direction of dispersion of wavelength with respect to the substrate, for the light condenser element or the light deflecting member.
摘要:
To provide a group III nitride crystal having sufficient conductivity and capable of growing in a short time, for growing the group III nitride crystal on a base substrate by vapor deposition at a growth rate of greater than 450 μm/hour and 2 mm/hour or less, by using a group III halogenated gas and NH3 gas, wherein Ge is doped into the group III nitride crystal by suing GeCl4 as a doping source, so that resistivity of the group III nitride crystal is 1×10−3 Ωcm or more and 1×10−2 Ωcm or less.
摘要:
A method of making a conductive group III nitride single crystal substrate includes feeding to a seed crystal a group III raw material gas, a group V raw material gas, and a doping raw material gas diluted with N2 or Ar to have a predetermined concentration, growing a group III nitride single crystal on the seed crystal at a growth rate of greater than 450 μm/hour and not greater than 2 mm/hour, and doping the group III nitride single crystal with an impurity contained in the doping raw material gas. The doping raw material gas is diluted to be inhibited from reacting with the group V raw material gas so as to allow the group III nitride single crystal to have a specific resistance of not less than 1×10−3 Ωcm and not more than 1×10−2 Ωcm.